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Through hole etching method, array base plate, liquid crystal panel and display equipment

A technology of array substrate and via hole, applied in the field of liquid crystal display, can solve the problems of complex process, overlapping and disconnection of pixel electrodes, mismatch of etching rate, etc., and achieve the effects of simple equipment, reduced manufacturing cost, and simple process

Inactive Publication Date: 2014-08-13
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] 1. Dry etching equipment is expensive and the process is complicated, which leads to an increase in the manufacturing cost of the pixel electrode via hole
[0009] 2. Due to the mismatch of etching rates during dry etching of different insulating layers, additional processes need to be added, which increases the manufacturing cost of pixel electrode via holes
[0010] 3. The via holes of the pixel electrodes obtained by dry etching are poor in shape, and the pixel electrodes are prone to overlap and disconnection, resulting in a decrease in the yield of the array substrate

Method used

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  • Through hole etching method, array base plate, liquid crystal panel and display equipment
  • Through hole etching method, array base plate, liquid crystal panel and display equipment
  • Through hole etching method, array base plate, liquid crystal panel and display equipment

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Embodiment Construction

[0021] An embodiment of the present invention provides a via hole etching method, comprising: exposing and developing an organic insulating layer formed on a gate insulating layer by using a via hole mask, so as to form a first via holes, exposing part of the gate insulating layer; the gate insulating layer covers the substrate on which the gate electrode is formed; wet etching the exposed gate insulating layer with hot phosphoric acid, to A second via hole is formed in the gate insulating layer, and the gate electrode is exposed, and the temperature of the hot phosphoric acid is 140° C. to 190° C.; the gate electrode, the gate electrode are sequentially formed by washing with warm water. an insulating layer, a substrate of the organic insulating layer; stripping off the via hole mask.

[0022] An embodiment of the present invention further provides an array substrate, which has a pixel electrode via hole prepared by using the above via hole etching method. The sidewall of th...

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Abstract

The invention discloses a through hole etching method, an array base plate, a liquid crystal panel and display equipment, relates to the technical field of liquid crystal display, and solves the problems that the manufacture cost of the existing pixel electrode through hole is high, and the through hole appearance is poor, so the qualification rate reduction and the like of a liquid crystal display of a thin film transistor can be caused. According to the embodiment of the invention, the exposure and development process of an organic insulation layer is combined with a wet etching process of hot phosphoric acid, the suspended organic insulation layer is softened through the high temperature of the hot phosphoric acid, the softened organic insulation layer is covered on a through hole of a grid electrode insulation layer under the gravity effect, and the automatic repairing of the appearance of the pixel electrode through hole can be realized. Compared with the prior art, the subsequent ashing hole expansion work procedure does not need to be added, the process is simple, and in addition, the wet etching equipment is simple and cheap, so the manufacture cost of the pixel electrode through hole is reduced, further, the manufacture cost of the liquid crystal display of the thin film transistor is further reduced, and in addition, the qualification rate of the liquid crystal display of the thin film transistor is improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a via hole etching method, an array substrate, a liquid crystal panel and a display device. Background technique [0002] With the continuous expansion of the production of flat panel display products, the competition among various manufacturers is becoming increasingly fierce. While continuously improving product performance, various manufacturers are also making continuous efforts to reduce product production costs, thereby enhancing market competitiveness. [0003] TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-Liquid Crystal Display) is a well-known flat-panel display product, and reducing production costs is also an important aspect of its technological innovation. [0004] On the TFT-LCD array substrate, the pixel electrodes are electrically connected to the gate electrodes through the pixel electrode via holes. When preparing th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/311H01L21/77G02F1/1362G03F7/00
Inventor 周伟峰薛建设
Owner BOE TECH GRP CO LTD