Through hole etching method, array base plate, liquid crystal panel and display equipment
A technology of array substrate and via hole, applied in the field of liquid crystal display, can solve the problems of complex process, overlapping and disconnection of pixel electrodes, mismatch of etching rate, etc., and achieve the effects of simple equipment, reduced manufacturing cost, and simple process
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[0021] An embodiment of the present invention provides a via hole etching method, comprising: exposing and developing an organic insulating layer formed on a gate insulating layer by using a via hole mask, so as to form a first via holes, exposing part of the gate insulating layer; the gate insulating layer covers the substrate on which the gate electrode is formed; wet etching the exposed gate insulating layer with hot phosphoric acid, to A second via hole is formed in the gate insulating layer, and the gate electrode is exposed, and the temperature of the hot phosphoric acid is 140° C. to 190° C.; the gate electrode, the gate electrode are sequentially formed by washing with warm water. an insulating layer, a substrate of the organic insulating layer; stripping off the via hole mask.
[0022] An embodiment of the present invention further provides an array substrate, which has a pixel electrode via hole prepared by using the above via hole etching method. The sidewall of th...
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