Film coating part and preparation method thereof

A technology for coating parts and magnetron sputtering coating, applied in the field of coating parts and their preparation, can solve the problems of limiting the application range of PVD of aluminum alloy substrates, large thermal expansion coefficient, and easy falling off of the film layer, so as to improve the service life and additional value, enhance competitiveness, and avoid the effect of weak cohesion

Inactive Publication Date: 2012-09-19
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the large thermal expansion coefficient of the aluminum alloy substrate, there is an adhesion problem when PVD non-metallic decorative film layers (such as color layers, etc.) Applications of PVD

Method used

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  • Film coating part and preparation method thereof
  • Film coating part and preparation method thereof
  • Film coating part and preparation method thereof

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preparation example Construction

[0024] The preparation method of the coating member 10 in the preferred embodiment of the present invention includes the following steps:

[0025] An aluminum alloy base 11 is provided, and the aluminum alloy base 11 is pre-treated. The pretreatment may include: successively wiping the surface of the aluminum alloy substrate 11 with deionized water and absolute ethanol, and placing the aluminum alloy substrate 11 in an ultrasonic cleaner containing an acetone solution for ultrasonic cleaning to remove the aluminum alloy substrate 11 Impurities and oil stains on the surface.

[0026] Plasma cleaning is performed on the surface of the aluminum alloy substrate 11 after the pretreatment to further remove dirt on the surface of the aluminum alloy substrate 11 and improve the bonding force between the surface of the aluminum alloy substrate 11 and the subsequent coating.

[0027] See figure 2 , Put the aluminum alloy substrate 11 into the coating chamber 21 of a vacuum sputtering machine...

Embodiment 1

[0041] Plasma cleaning: The flow of argon gas is 280sccm, the bias voltage of the aluminum alloy substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0042] Sputtered aluminum layer 12: Ar gas flow rate is 150 sccm, the bias voltage of the aluminum alloy substrate 11 is -200V, the sputtering temperature is 30°C, the sputtering time is 20 minutes, and the thickness of the aluminum layer 12 is 120 nm;

[0043] Sputtering the first AlON layer 131: Argon flow rate is 150 sccm, nitrogen flow rate is 20 sccm, oxygen flow rate is 20 sccm, the bias voltage of the aluminum alloy substrate 11 is -200V, the sputtering temperature is 30°C, and the sputtering time is 30 minutes. The thickness of an AlON layer 131 is 130 nm, the atomic percentage of Al is 70 at.%, O is 15 at.%, and N is 15 at.%;

[0044] Sputtering the second AlON layer 133: Argon flow rate is 150 sccm, nitrogen flow rate is 40 sccm, oxygen flow rate is 40 sccm, the bias voltage of the aluminum alloy substrate 11 is...

Embodiment 2

[0048] Plasma cleaning: The flow of argon gas is 280sccm, the bias voltage of the aluminum alloy substrate 11 is -300V, and the plasma cleaning time is 7 minutes;

[0049] Sputtering aluminum layer 12: the flow of argon is 200 sccm, the bias voltage of the aluminum alloy substrate 11 is -200V, the sputtering temperature is 50°C, the sputtering time is 30 minutes, and the thickness of the aluminum layer 12 is 180 nm;

[0050] Sputtering the first AlON layer 131: Argon flow rate is 200 sccm, nitrogen flow rate is 25 sccm, oxygen flow rate is 25 sccm, the bias voltage of the aluminum alloy substrate 11 is -100V, the sputtering temperature is 50°C, and the sputtering time is 40 minutes. The thickness of an AlON layer 131 is 150 nm, the atomic percentage of Al is 65 at.%, O is 18 at.%, and N is 17 at.%;

[0051] Sputtering the second AlON layer 133: Argon flow rate is 200 sccm, nitrogen flow rate is 45 sccm, oxygen flow rate is 45 sccm, the bias voltage of the aluminum alloy substrate 11 ...

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Abstract

The invention provides a film coating part and a preparation method of the film coating part. The film coating part comprises an aluminum alloy substrate, and a gradient combination layer and a decoration layer which are formed on the surface of the aluminum alloy substrate in sequence, wherein the gradient combination layer comprises a plurality of aluminum-oxygen-nitrogen layers, the atomic percentage composition of aluminum in the aluminum-oxygen-nitrogen layers is gradually reduced from a direction close to the aluminum alloy substrate to a direction far away from the aluminum alloy substrate, the atomic percentage compositions of oxygen and nitrogen are gradually increased from a direction close to the aluminum alloy substrate to a direction far away from the aluminum alloy substrate, and the decoration layer is a nonmetallic layer. The preparation method of the film coating part comprises the following steps: providing the aluminum alloy substrate; spluttering the aluminum-oxygen-nitrogen layers on the aluminum alloy substrate by a vacuum spluttering method so as to form the gradient combination layer, spluttering the gradient combination layer by taking an aluminum target as a target material, and oxygen and nitrogen as reaction gas; and spluttering the decoration layer on the surface of the gradient combination layer by the vacuum spluttering method, and the decoration layer is the nonmetallic layer.

Description

Technical field [0001] The invention relates to a coated piece and a preparation method thereof, in particular to a coated piece with good corrosion resistance and a preparation method of the coated piece. Background technique [0002] Aluminum alloy has many advantages such as light weight and good heat dissipation performance. It is widely used in communications, electronics, transportation, construction, and aerospace. A protective film of aluminum oxide (about 10nm thick) is formed on the surface of aluminum alloy in the air. Under normal atmospheric conditions, this layer of aluminum oxide film on the surface of aluminum alloy can effectively protect the aluminum alloy substrate. However, in moisture containing electrolytes, such as the atmospheric environment on the surface of the ocean, pitting corrosion will occur on the surface of the aluminum alloy, which will seriously damage the appearance of the product and shorten the product life. In order to improve the corrosion...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35
CPCC23C14/0036C23C14/027C23C14/35C23C14/06C23C14/0641Y10T428/265Y10T428/24975Y10T428/12549
Inventor 张新倍陈文荣蒋焕梧陈正士马楠
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
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