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Etching liquid for TFT (thin film transistor)array substrate copper conductor

An array substrate and etching solution technology, applied in the field of etching solution, can solve the problems of increased engineering control difficulty, short process window, short service life, etc., so as to improve the short process window, reduce the difficulty of engineering control, and improve the service life. Effect

Active Publication Date: 2012-10-03
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] (1) The etchant generally has a short process window in the process of etching the metal layer, which makes engineering control more difficult and seriously affects the stability and production yield of engineering production;
[0008] (2) At present, the use of copper wire etching solution generally has unstable shelf-time conditions, and it is easy to have disadvantages such as unstable etching performance and reduced process window in the later stage of storage;
[0009] (3) The service life is generally short (≤3000ppm), and the process window narrows and the performance becomes unstable in the later stage of the process, showing defects such as large critical dimension loss (CD loss)

Method used

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  • Etching liquid for TFT (thin film transistor)array substrate copper conductor
  • Etching liquid for TFT (thin film transistor)array substrate copper conductor
  • Etching liquid for TFT (thin film transistor)array substrate copper conductor

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Embodiment Construction

[0033] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0034] The invention provides an etchant for copper wires of a TFT array substrate, which is mainly aimed at metal structures such as Cu / Mo and Cu / Mo-alloys. The metal alloy can include materials such as Mg, Al, Ni, V, Mn or Si, and a molybdenum layer is used. Or the molybdenum alloy layer is used as the lower layer metal to improve the adhesion and barrier effect of the lower layer metal to the glass and to stabilize the electrode potential of the barrier metal layer in the etching solution. The etching solution comprises: a main oxidant, a secondary oxidant, a chelating agent, an inhibitor, and an additive, the main oxidant is hydrogen peroxide, the secondary oxidant is phosphoric acid, sulfuric acid, and nitric acid; the chelating agent is a...

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Abstract

The invention relates to etching liquid for a TFT (thin film transistor)array substrate copper conductor. The etching liquid comprises primary oxidant, secondary oxidant, a chelating agent, inhibitor and additive, wherein the primary oxidant is hydrogen peroxide; the secondary oxidant is phosphoric acid, sulfuric acid and nitric acid; the chelating agent is amino compounds; the inhibitor is aminoimidazole compounds and carboxylic acid compounds; and the additive is amine compounds containing ammonia nitrogen and carboxy oxygen coordination atoms. According to the etching liquid, the characteristic of shorter process windows of the etching liquid for the copper conductors is obviously improved, the engineering control difficulty is reduced, and the stability of engineering production and the output yield are improved by means of the components and the types of the novel chelating agent and the additive; the shelf-time stability is improved, and the stability of the etching performance can be kept in the later shelf-time storage period; and the service life (more than or equal to 5,000 ppm) is prolonged, the process windows are not obviously narrowed in the later processing period, and the properties and the like are relatively stable.

Description

technical field [0001] The invention relates to the field of etching solution, in particular to an etching solution for copper wires of a TFT array substrate. Background technique [0002] A liquid crystal display (LCD, Liquid Crystal Display) has many advantages such as a thin body, power saving, and no radiation, and has been widely used. The existing liquid crystal display device includes a liquid crystal display panel and a backlight module (Backlight Module). Generally, a liquid crystal display panel includes a CF (Color Filter) substrate, a TFT (Thin Film Transistor) array substrate, and a liquid crystal (Liquid Crystal) disposed between the CF substrate and the TFT array substrate. By supplying power to the TFT array substrate or not, the direction of the liquid crystal molecules is controlled, and the light from the backlight module is projected onto the CF substrate to generate a picture. [0003] The performance characteristics and operating characteristics of a ...

Claims

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Application Information

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IPC IPC(8): C23F1/18
CPCH01L21/32134H01L27/124C23F1/18
Inventor 寇浩
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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