Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine

A recovery device and gas-liquid separation technology, which is applied in the direction of exposure device, separation method, and dispersed particle separation in photolithography process, so as to reduce vibration and fluctuation of flow field and avoid vibration problems

Active Publication Date: 2012-10-03
ZHEJIANG CHEER TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to solve the problem of flow field sealing in partial immersion lithography technology, the object of the present invention is to provide an air seal

Method used

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  • Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine
  • Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine
  • Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine

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Embodiment Construction

[0036] The specific implementation process of the present invention will be described in detail below in conjunction with the drawings and embodiments.

[0037] Such as figure 1 As shown, the air seal and gas-liquid separation and recovery device are installed between the projection objective lens group 1 and the silicon wafer 3 in the immersion lithography machine; the gas seal and gas-liquid separation and recovery device include sealing and liquid injection recovery device 2, The gas-liquid separation sheet group 4 and the liquid recovery sheet group 5; the sealing and liquid injection recovery device 2 is composed of the front end cover 2A of the immersion unit and the rear end cover 2B of the immersion unit; wherein:

[0038] 1) Immersion unit rear end cover 2B:

[0039] Such as Figure 5 As shown, there is a central through hole in the rear end cover 2B of the immersion unit, and the projection objective lens group 1 passes through the central through hole, and the seven...

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PUM

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Abstract

The invention discloses a hermetic sealing and gas-liquid separation and recovery device for an immersed photoetching machine, which is installed between a projection objective group of the immersed photoetching machine and a silicon wafer, and comprises a seal and injected liquid recovery device, a gas-liquid separation sheet group and a liquid recovery sheet group, wherein the seal and injected liquid recovery device is composed of an immersion unit front end cover and an immersion unit rear end cover. The hermetic seal and gas-liquid separation and recovery device is used for completing the functions of seal and injected liquid recovery in a slit flow field of the immersed photoetching system, so as to achieve continuous and stable updating of the slit flow field. A hermetic sealing structure is used at the edge of the slit flow field to prevent liquid leakage, a gas-liquid separation and recovery structure is adopted to achieve separation and respective recovery of gas and liquid, and generation of gas-liquid two-phase flow is avoided, so that the pipeline vibration problem caused by simultaneous recovery of gas-liquid two-phase flow is avoided. No matter which direction the silicon wafer moves to, the gas-liquid separation and recovery structure can dynamically adjust the height of the liquid level in the device.

Description

technical field [0001] The invention relates to a flow field sealing and recovery device, in particular to an air sealing and gas-liquid separation and recovery device for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly optical lithography. It uses the optical system to accurately project and expose the pattern on the mask to the photoresist-coated surface. on a silicon wafer. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist. [0003] Immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the silicon wafer, which improves the numerical aperture of the projection objective lens ( NA), thereby improving the resolution ...

Claims

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Application Information

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IPC IPC(8): G03F7/20B01D46/12
Inventor 傅新陈文昱徐宁
Owner ZHEJIANG CHEER TECH CO LTD
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