Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine

Abstract

The invention discloses a hermetic sealing and gas-liquid separation and recovery device for an immersed photoetching machine, which is installed between a projection objective group of the immersed photoetching machine and a silicon wafer, and comprises a seal and injected liquid recovery device, a gas-liquid separation sheet group and a liquid recovery sheet group, wherein the seal and injected liquid recovery device is composed of an immersion unit front end cover and an immersion unit rear end cover. The hermetic seal and gas-liquid separation and recovery device is used for completing the functions of seal and injected liquid recovery in a slit flow field of the immersed photoetching system, so as to achieve continuous and stable updating of the slit flow field. A hermetic sealing structure is used at the edge of the slit flow field to prevent liquid leakage, a gas-liquid separation and recovery structure is adopted to achieve separation and respective recovery of gas and liquid, and generation of gas-liquid two-phase flow is avoided, so that the pipeline vibration problem caused by simultaneous recovery of gas-liquid two-phase flow is avoided. No matter which direction the silicon wafer moves to, the gas-liquid separation and recovery structure can dynamically adjust the height of the liquid level in the device.

Description

technical field [0001] The invention relates to a flow field sealing and recovery device, in particular to an air sealing and gas-liquid separation and recovery device for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly optical lithography. It uses the optical system to accurately project and expose the pattern on the mask to the photoresist-coated surface. on a silicon wafer. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist. [0003] Immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the silicon wafer, which improves the numerical aperture of the projection objective lens ( NA), thereby improving the resolution ...

AI Technical Summary

Problems solved by technology

[0007] In order to solve the problem of flow field sealing in partial immersion lithography technology, the object of the present invention is to provide an air seal and gas-liquid separation and recovery device for immersion lithography machines, using an air seal structure at the edge of the flow field to prevent liquid leakage

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