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Potentiometric titration method of mixed acid concentration in aluminum etching liquid

A potentiometric titration and aluminum etching technology, applied in the field of etching solution, can solve the problems of reducing the accuracy and repeatability of the titration result, increasing the uncertainty of the titration result, and the complicated operation of the titration process, so as to achieve the effect of reducing the complexity of the operation.

Active Publication Date: 2012-11-14
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

These methods are all realized by two-step titration and calculation. The titration process is cumbersome to operate, and a variety of titrants and solvent systems are used, which increases the uncertainty of the titration results, thereby reducing the accuracy and repeatability of the titration results.

Method used

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  • Potentiometric titration method of mixed acid concentration in aluminum etching liquid
  • Potentiometric titration method of mixed acid concentration in aluminum etching liquid
  • Potentiometric titration method of mixed acid concentration in aluminum etching liquid

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Embodiment Construction

[0038] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0039] see figure 2 and image 3 , the present invention provides a kind of potentiometric titration method of the mixed acid concentration of aluminum etching solution, the potentiometric titration method of the mixed acid concentration of aluminum etching solution of the present invention adopts monohydric alcohol and dibasic alcohol as the non-aqueous medium of aluminum etching solution mixed acid, with strong base- Ethanol solution is titrant, realizes single-acid concentration in one-step potentiometric titration aluminum etching solution mixed acid, and described strong base can be potassium hydroxide, and its analytical pure (AR) concentration is greater than or equal to 85%; Described strong base can also be For sodium hydroxide, its...

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Abstract

The invention provides a potentiometric titration method of mixed acid concentration in aluminum etching liquid. The method adopts prepared and calibrated potassium hydroxide-ethanol solution or sodium hydroxide-ethanol solution as titrant, and adopts monobasic alcohol and dibasic alcohol as non-aqueous medium of aluminum etching liquid mixed acid, to realize one-step potentiometric titration of concentration of each single acid in the mixed acid, thereby reducing operation complexity and test result uncertainty during test process, and realizing accurate and high-efficiency test. The method can rapidly and accurately determine concentration of each acid (nitric acid, phosphoric acid and acetic acid) in aluminum etching liquid mixed acid.

Description

technical field [0001] The invention relates to the field of etching solutions, in particular to a potentiometric titration method for the concentration of mixed acids in an aluminum etching solution. Background technique [0002] Wet etching is the core process of patterning the metal film layer with an acidic etching solution in the TFT manufacturing process, and then forming the gate (Gate), source-drain (Source-Drain), and pixel (Indium Tin Oxides, ITO) electrodes. Among them, aluminum and molybdenum are often used as conductive materials to form gates. Various acids can be used for the etching solution, but most of them use strong acid mixtures (phosphoric acid, nitric acid, and glacial acetic acid) to dissolve and redox them. Patterning of the gate film layer. [0003] The mixed acid composition of the aluminum etching solution is roughly phosphoric acid (70-72%), nitric acid (1.8%-2.0%), and glacial acetic acid (8.0%-10.0%). Among them, nitric acid plays the role of...

Claims

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Application Information

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IPC IPC(8): G01N31/16
CPCG01N31/16G01N31/164
Inventor 徐蕊张维维巫景铭朱洪辉王俐何小波黄红青
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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