Method for preparing amorphous/nanometer crystal multilayer-structure film

A multi-layer structure and nanocrystalline layer technology, which is applied in coating, metal material coating process, ion implantation plating, etc., can solve the problem of test sample fracture, etc., and achieve low cost, clear structure, easy to realize and popularize Effect

Inactive Publication Date: 2013-02-13
昆山昊盛泰纳米科技有限公司
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Problems solved by technology

[0005] In addition, due to the non-uniform plastic deformation of metallic glasses at room temperature, mainly through the formation of shear bands, rapid proliferation, propagation, and eventually the fracture of test samples

Method used

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  • Method for preparing amorphous/nanometer crystal multilayer-structure film
  • Method for preparing amorphous/nanometer crystal multilayer-structure film
  • Method for preparing amorphous/nanometer crystal multilayer-structure film

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Embodiment Construction

[0021] The main principle of the method adopted in the present invention is: in the magnetron sputtering coating process, the intermittent deposition process is adopted to keep the film growth at a lower temperature all the time, effectively protecting various film structures from being damaged (if continuous deposition Coating, it is easy to cause the temperature of the film to rise so that the structure of the amorphous layer is destroyed, and the grains of the nanocrystalline layer are coarse), through a specific element ratio, a negative mixing heat can be formed between sputtering atoms, and magnetron sputtering This unbalanced atomic deposition method can effectively obtain amorphous thin films. In addition, by controlling the different settings of a series of experimental parameters such as rotation speed, bias voltage, and power during the sputtering process, it is possible to realize the alternate alternation of the amorphous layer film and the nanocrystalline layer fi...

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Abstract

The invention discloses a method for preparing an amorphous/nanometer crystal multilayer-structure film. The amorphous/nanometer crystal multilayer-structure film is characterized in that the amorphous/nanometer crystal multilayer-structure film is composed of two entirely different crystal structures of a nanometer crystal structure and an amorphous structure, and has a multilayer structure composed of alternately overlapped amorphous layers and nanometer crystal layers. The amorphous/nanometer crystal multilayer-structure film prepared by the method has a compact film structure and clear interface layers. The method realizes control of a blending proportion of amorphous layers and nanometer crystal layers by control of thickness sizes (reaching to nanoscale) of different film layers thereby changing a blending proportion and even gradually changing a blending proportion, provides a novel research method for shear band deformation and size effects of a micro-amorphous alloy, provides a novel approach for improvement of mechanical properties such as ductility and toughness of an amorphous alloy thereby providing possibility for preparation of a mechanical property-controllable amorphous/nanometer crystal composite material, has simple processes and a low cost, and can be industrialized and popularized easily.

Description

technical field [0001] The invention belongs to the technical field of metal thin film materials, and relates to an amorphous / nanocrystalline multilayer structure thin film, in particular to a method for preparing an amorphous / nanocrystal multilayer structure thin film by magnetron sputtering technology. Background technique [0002] Glasses composed of metallic bonds are called metallic glasses. Unlike crystalline materials, the internal atomic arrangement of metallic glasses has the characteristics of long-range disorder and short-range order, and there are no grain boundaries inside, and there are no crystal structure defects such as dislocations. Therefore, metallic glass has many excellent properties, such as: compressive strength close to the theoretical value, good elastic properties (elastic limit strain is about 2%), good soft magnetic properties, corrosion resistance and wear resistance, etc. In addition, it should be pointed out that when the temperature rises cl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54C23C14/16
Inventor 王飞黄平王文龙
Owner 昆山昊盛泰纳米科技有限公司
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