Production method of nano-grade spherical silica powder

A production method, the technology of spherical silicon, applied in the direction of nanotechnology, chemical instruments and methods, silicon compounds, etc., can solve the problems affecting the performance of silicon material products, uneven particle size distribution, uncontrollable particle size, etc., to achieve low cost, Good thermal conductivity and short process cycle

Inactive Publication Date: 2013-03-06
NINGBO GUANGBO NEW NANOMATERIALS STOCK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] In the prior art, due to reasons such as unsuitable equipment or poorly adjusted process parameters, the produced silicon powder often has shortcomings such as low purity, un...

Method used

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  • Production method of nano-grade spherical silica powder
  • Production method of nano-grade spherical silica powder
  • Production method of nano-grade spherical silica powder

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Embodiment 1

[0021] The production method of nano-scale spherical silicon powder in this embodiment is carried out in a reaction system composed of a high-temperature evaporator, a particle controller and a collector connected in sequence, including the following steps:

[0022] (1) Add silicon block raw materials with a purity ≥99.9% into the crucible in the high-temperature evaporator through the feeding port, vacuumize the reaction system, and then open the argon valve at the bottom of the high-temperature evaporator to fill the reaction system with Argon, the atmosphere inside the reaction system was made inert and the pressure inside the reaction system was 110 kPa.

[0023] (2) Turn on the plasma gun installed on the top of the high-temperature evaporator, use the generated high-frequency plasma gas as a heating source to heat the raw material of the silicon block, and heat the raw material of the silicon block to a boiling state to form silicon vapor; the gas that generates the high-...

Embodiment 2

[0029] The production method of nano-scale spherical silicon powder in this embodiment is carried out in a reaction system composed of a high-temperature evaporator, a particle controller and a collector connected in sequence, including the following steps:

[0030] (1) Add silicon block raw materials with a purity ≥99.9% into the crucible in the high-temperature evaporator through the feeding port, vacuumize the reaction system, and then open the argon valve at the bottom of the high-temperature evaporator to fill the reaction system with Argon, the atmosphere inside the reaction system was made inert and the pressure inside the reaction system was 110 kPa.

[0031] (2) Turn on the plasma gun installed on the top of the high-temperature evaporator, use the generated high-frequency plasma gas as a heating source to heat the raw material of the silicon block, and heat the raw material of the silicon block to a boiling state to form silicon vapor; the gas that generates the high-...

Embodiment 3

[0037] The production method of nano-scale spherical silicon powder in this embodiment is carried out in a reaction system composed of a high-temperature evaporator, a particle controller and a collector connected in sequence, including the following steps:

[0038] (1) Add silicon block raw materials with a purity ≥99.9% into the crucible in the high-temperature evaporator through the feeding port, vacuumize the reaction system, and then open the argon valve at the bottom of the high-temperature evaporator to fill the reaction system with Argon, the atmosphere inside the reaction system was made inert and the internal pressure of the reaction system was 105 kPa.

[0039] (2) Turn on the plasma gun installed on the top of the high-temperature evaporator, use the generated high-frequency plasma gas as a heating source to heat the raw material of the silicon block, and heat the raw material of the silicon block to a boiling state to form silicon vapor; the gas that generates the ...

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Abstract

The invention provides a production method of nano-grade spherical silica powder, which is carried out in a reaction system which consists of a high-temperature evaporator, a particle controller and a collector which are communicated in sequence. The method comprises the following steps of: adding a silicon briquette with purity of more than or equal to 99.9 percent into the high-temperature evaporator, vacuumizing the reaction system, introducing argon to allow the pressure inside the reaction system to be between 75 and 150kPa; starting a plasma gun, and heating the silicon briquette into silicon vapor; regulating the flow rate of argon to be between 15 and 120m<3>/h to deliver the silicon vapor into the particle controller, and curing to form silicon powder particles; delivering the silicon powder particles into the collector by virtue of the argon flow to allow the silicon powder particles to be attached in the collector, and concentrating to obtain the nano-grade spherical silicon powder with purity of more than or equal to 99.9 percent, particle diameter of between 10 and 3,000nm and spherical shape. The nano-grade spherical silicon powder produced by using the method is high in purity and uniform in granularity distribution, and the particle diameter can be controlled in any range of between 10 and 3,000nm.

Description

technical field [0001] The invention relates to the technical field of material preparation, in particular to a production method of nanoscale spherical silicon powder. Background technique [0002] In the prior art, due to reasons such as unsuitable equipment or poorly adjusted process parameters, the produced silicon powder often has shortcomings such as low purity, uneven particle size distribution, and uncontrollable particle size, which affects the use of the nano-scale spherical silicon powder. The performance of silicon material products made of powder. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a production method of nano-scale spherical silicon powder. The nano-scale spherical silicon powder produced by this production method has high purity, uniform particle size distribution, and particle size can be controlled at any size between 10 and 3000nm. area. [0004] The technical scheme adopted in the...

Claims

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Application Information

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IPC IPC(8): C01B33/021B82Y40/00
Inventor 赵登永陈钢强王光杰陆永波潘经珊
Owner NINGBO GUANGBO NEW NANOMATERIALS STOCK
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