Continuous charging silicon single crystal furnace
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 无锡市蓝德光电科技有限公司
- Publication Date
- 2013-03-27
- Estimated Expiration
- Not applicable · inactive patent
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to a continuous feeding silicon single crystal furnace. Background technique
[0002] Silicon single crystals are widely used in the semiconductor and photovoltaic industries. The production process of silicon single crystal rod is as follows: place the quartz crucible containing silicon raw material in the silicon single crystal pulling growth furnace; vacuumize the growth furnace and heat it until the silicon raw material melts; The top is slowly approaching the melt surface and is in contact with it; the seed crystal is gradually pulled up according to the process requirements. By controlling the speed and temperature of the seed crystal, the ingot is gradually pulled out from the liquid surface.
[0003] In the process of silicon single crystal production, a certain amount of other elements are generally added to the silicon raw material, which is called doping. These elements can be boron, phosphorus or antimony, etc. Diff...