Reverse conducting type insulated gate bipolar transistor without snapback effect
A bipolar transistor, reverse conduction technology, applied in the field of semiconductor power devices, can solve problems such as increasing the complexity of circuit design
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[0027] A reverse conducting insulated gate bipolar transistor without snapback effect, its structure is as follows figure 2 As shown, it includes metallized emitter 1, field oxide layer 2, polysilicon gate electrode 3, gate oxide layer, N+ source region 4, P body region 5, N- drift region 6, N buffer layer 8, N collector region 9 , P collector region 10 and metallized collector 12; P body region 5 is located on top of N-drift region 6, N+ source region 4 is located in P body region 5, and gate oxide layer is located in N+ source region 4, P body region 5 and The surface of the N-drift region 6, the polysilicon gate electrode 3 is located on the surface of the gate oxide layer, the metallized emitter 1 covers the remaining surfaces of the N+ source region 4 and the P body region 5, and the gap between the metallized emitter 1 and the polysilicon gate electrode 3 is Field oxide layer 2. The lower surface of the N-drift region 6 has a P floating region 7 and an N buffer layer 8...
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