Cleaning method of optical substrate for laser thin-film element
A laser thin film and optical technology, applied in the field of optics, can solve the problems of increased surface roughness, difficult to remove sub-micron particles, and no connection, etc., and achieve the effect of increasing the damage threshold, increasing the damage threshold, and improving the cleaning efficiency
A laser thin film and optical technology, applied in the field of optics, can solve the problems of increased surface roughness, difficult to remove sub-micron particles, and no connection, etc., and achieve the effect of increasing the damage threshold, increasing the damage threshold, and improving the cleaning efficiency
CN103042008AInactive Publication Date: 2013-04-17TONGJI UNIV
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Embodiment 1
[0022] Embodiment 1: The whole process process cleaning of K9 optical substrate:
[0023] Use a cotton swab dipped in acetone to gently wipe the optical substrate in the order of side, back, and surface, and use an 80W incandescent lamp to observe until there are no particles, fingerprints, oil stains and other pollutants visible to the naked eye on the surface of the substrate under the incandescent lamp; Add alkaline solution into the first cleaning tank, the temperature of the solution is 45°C, and the ratio of alkaline solution is NH 4 OH:H 2 o 2 :H 2 O=1:10:50, put the wiped crystal substrate in the first cleaning tank, and use the frequency of 20KHz, 80KHz, and 120KHz to clean the substrate successively for 2 to 4 minutes. The substrate is pulled out of the solution at a high speed; then the substrate is placed in the second cleaning tank and sprayed with 45°C deionized water for 2 minutes; then the substrate is placed in the third cleaning tank of 45°C deionized wate...
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The invention relates to a cleaning method of an optical substrate for a laser thin-film element. The cleaning method includes the specific methods: using a cotton swab dipped with acetone for wiping the optical substrate until the surface of the substrate is free of macroscopic contaminants under the irradiation of an incandescent lamp; placing the wiped substrate in alkaline solution of a first tank, and respectively performing ultrasonic cleaning for the substrate successively by different frequencies; placing the substrate in a second tank, and using deionized water for spraying; and placing the substrate in deionized water of a third tank, successively subjecting the substrate to ultrasonic with different frequencies for 3-6 minutes, observing the surface cleanliness of the substrate under the incandescent lamp, and after the surface of the substrate is free of macroscopic particles, placing the substrate in deionized water of a fourth tank for slow lifting under ultrasonic of 80KHz, and drying the lifted substrate by hot blowing so that the required product is obtained. A cleaning processing and surface detection are combined together, a wiping method, a chemical cleaning method and an ultrasonic cleaning method are combined for comprehensive application, so that high cleaning efficiency and optimal cleaning effect less in damage to the smooth surface of the substrate are achieved.
Description
technical field [0001] The invention relates to a cleaning method of an optical substrate for a laser thin-film element, in particular to a cleaning method for reducing the surface defect density of the substrate and increasing the laser damage threshold of the laser thin-film element through the process control of the whole process, which belongs to the field of optical technology. Background technique [0002] Laser film is a key component in high-power laser systems, and its performance largely determines the output performance of the laser. Laser film is also a weak link in high-power laser systems, and its damage threshold directly determines the strength of laser output and endangers the stable operation of high-power laser systems. Improving the performance of laser thin films and increasing the damage threshold of laser thin films has always been an important content in the field of laser and thin films. [0003] There are many factors that affect the final damage t...
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Patent Timeline
17 Apr 2013
Publication
CN103042008A
- IPC
- B08B7/04; B08B3/08; B08B3/12; B08B1/00
- Inventors
- 丁涛; 谢雨江