Unlock instant, AI-driven research and patent intelligence for your innovation.

Constant linewidth control device for narrow-linewidth excimer laser

A technology for excimer lasers and stable control devices, which is applied in the direction of lasers, phonon exciters, and laser components, can solve problems such as complex structures, inability to adjust and accurately control the line width of lasers, and non-adjustable slit widths. Easy to install and adjust

Active Publication Date: 2013-05-01
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the structure of the device is complicated, and it is difficult to install and adjust in the line width narrowing module with limited space
In addition, the long-term deformation of the grating will affect its service life
[0003] In the prior art [US20020031158 A1], a slit device is also used to narrow the spectral linewidth of the laser, but the slit width cannot be adjusted, so the laser linewidth cannot be adjusted and precisely controlled

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Constant linewidth control device for narrow-linewidth excimer laser
  • Constant linewidth control device for narrow-linewidth excimer laser
  • Constant linewidth control device for narrow-linewidth excimer laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] See figure 1 , figure 1 It is a diagram of the linewidth stability control device for narrow linewidth excimer lasers. It can be seen from the figure that the linewidth stability control device for narrow linewidth excimer lasers of the present invention is characterized in that the device is composed of a beam splitter 1, It consists of adjusting slit 2, high-precision spectrometer 3, and line width feedback control system 4. The positional relationship of the above-mentioned parts is as follows:

[0025] The excimer laser is composed of a coupling output mirror 7, a discharge cavity 8, and a line width reduction module 9. The beam splitter 1 is placed outside the coupling output mirror 7 of the narrow line width excimer laser. The adjusting slit 2 is placed in the narrow linewidth excimer laser, and the beam splitter 1 divides the output laser into a transmitted first beam 5 and a reflected second beam 6, the first beam 5 As the main energy output, the second beam 6 is i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a constant linewidth control device for a narrow-linewidth excimer laser. The device consists of an optical splitter, an adjustable slit, a high-precision spectrum instrument and a linewidth feedback control system. Through the constant linewidth control device, the linewidth of laser output by the excimer laser can be stably controlled, and the constant linewidth control device has the characteristics of being convenient to use, simple in structure, and capable of continuously adjusting the linewidth of the excemer laser.

Description

Technical field [0001] The invention relates to an excimer laser, in particular to a line width stability control device for a narrow line width excimer laser. Narrow linewidth excimer lasers, such as ArF lasers or KrF lasers, are currently the main lithography light sources in the deep ultraviolet range. The line width continuous adjustment device disclosed by the invention is practical and simple in structure, can be aligned with the molecular laser line width within a certain line width range for continuous adjustment, and realizes the stable control of the spectral line width. Background technique [0002] The line width of the lithography light source directly affects the feature size of semiconductor lithography, so precise control of the laser line width is very important in the field of semiconductor lithography. The prior art [US8259764 B2] generally uses a device for applying stress to the echelle grating to change the wavefront and incident angle of the laser reaching...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01S3/136H01S3/13
Inventor 袁志军张海波周军楼祺洪魏运荣
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More