Active drive cable table of lithography machine wafer stage

Abstract

The invention proposes an active drive cable table of a lithography machine wafer stage. The active drive cable table of the lithography machine wafer stage comprises a Y-direction sliding table, a Y-direction lead rail and a five-connecting rod mechanism, wherein the Y-direction sliding table is arranged on the Y-direction lead rail through an air bearing; one end of the five-connecting-rod mechanism is connected to the Y-direction sliding table; the other end of the five-connecting-rod mechanism is connected to the wafer stage through a cable facility; the Y-direction sliding table is driven by the motor to keep synchronous movement together with the wafer stage in a Y direction; the cable facility is conveyed to the wafer stage along the five-connecting-rod mechanism via the Y-direction sliding table; and the five-connecting-rod mechanism comprises an active drive joint for driving the five-connecting-rod mechanism to move along the X direction, so as to drive the cable facility to move along the X direction. The active drive cable table of the lithography machine wafer stage provided by the invention achieves active control on the cable table and pursuit movement of the wafer stage in an X-Y plane by the wafer stage.

Description

technical field [0001] The invention relates to the field of semiconductor photolithography equipment, and in particular to an active driving cable stage of a silicon wafer stage of a photolithography machine. Background technique [0002] In semiconductor lithography equipment, the movement system of silicon wafer table precision workpiece table is an extremely important key component. Its positioning accuracy directly affects the performance of lithography equipment, and its operating speed directly affects the production efficiency of lithography equipment. With the continuous improvement of the integration of VLSI devices and the continuous enhancement of lithography resolution, the requirements for the characteristic line width index of lithography machines are also continuously improved, and the corresponding requirements for the operating speed, acceleration and accuracy of the workpiece table are also constantly increasing. improve. [0003] The typical structural f...

AI Technical Summary

Problems solved by technology

The pipeline facilities of this scheme are supported in the vertical direction to avoid friction between the sag and the work surface, but passively follow the movement of the wafer stage in the Y direction, which will affect the positioning accuracy of the movement of the wafer stage

[0005] Another example of the prior art discloses a cable table for a lithography machine silicon wafer table using a multi-joint manipulator. The cable table includes a control device and at least one multi-joint manipulator. On the silicon wafer stage, by controlling the rotation angle of each joint driver to ensure that the pipeline facilities actively follow the movement of the silicon wafer stage in the XY plane, avoiding the impact of the pipeline facilities on the movement positioning accuracy of the silicon wafer stage, but the structure of the cable stage is complex, The large number of manipulator joints leads to a large number of drives used, and at the same time, the design of the redundant degree of freedom manipulator control system is relatively complicated, and the development cost is relatively high

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