Zn (zinc)-Sb (stibium)-Te (tellurium) phase change storage thin-film material for phase change memory and preparation method of Zn-Sb-Te phase change storage thin-film material

A phase change memory, zn-sb-te technology, applied in the direction of electrical components, etc., can solve the problems that affect the data access speed and reliability of PRAM, the poor stability of N-Sb-Te, and the phase change mutation point is not obvious. , to achieve the effect of improving the crystallization temperature and data retention ability, fast crystallization speed, and easy industrial mass production

Inactive Publication Date: 2013-08-14
NINGBO UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] At present, the traditional phase change memory materials used in phase change memory are mainly Ge 2 Sb 2 Te 5 , but due to its low crystallization temperature (about 150°C), traditional Ge 2 Sb 2 Te 5 The data of the PRAM storage unit whose material is the storage medium can only be stored for 10 years at 70-110°C, and the data storage life at high temperature is short and needs to be improved
Compared with traditional Ge 2 Sb 2 Te 5 Phase-change memory materials, Si-Sb-Te has shown relatively excellent performance, such as the invention patent named Si-Sb-Te material for phase-change memory (publication number is CN102130298A), it discloses based on the element Si, Sb, Te phase change material, the increase of Si content in this material can improve the data retention of the material, and its crystallization temperature can also reach about 277°C, but the distribution of Si element in the film is not very uniform, which will caus...

Method used

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  • Zn (zinc)-Sb (stibium)-Te (tellurium) phase change storage thin-film material for phase change memory and preparation method of Zn-Sb-Te phase change storage thin-film material
  • Zn (zinc)-Sb (stibium)-Te (tellurium) phase change storage thin-film material for phase change memory and preparation method of Zn-Sb-Te phase change storage thin-film material
  • Zn (zinc)-Sb (stibium)-Te (tellurium) phase change storage thin-film material for phase change memory and preparation method of Zn-Sb-Te phase change storage thin-film material

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Embodiment 1

[0028] A Zn-Sb-Te phase-change memory film material for phase-change memory according to the present invention is composed of three elements Zn, Sb and Te, and the three elements of zinc, antimony and tellurium in the phase-change material are two by two bonds to form a ternary system.

Embodiment 2

[0030] A kind of Zn-Sb-Te phase-change memory film material used for phase-change memory of the present invention, its general chemical structure formula is Zn X (Sb 2 Te 3 ) 100-X , where 0

[0031] In the magnetron sputtering coating system (JGP-450 type), the zinc single target is installed in the magnetron direct current (DC) sputtering target, and the Sb 2 Te 3 The target is installed in the magnetron radio frequency (RF) sputtering target, and the quartz sheet or silicon oxide sheet is used as the substrate. The sputtering chamber of the magnetron sputtering coating system is vacuumed until the vacuum degree of the chamber reaches 1.6×10 -4 Pa, and then pass high-purity argon gas with a volume flow rate of 47.6ml / min (SCCM standard condition milliliter per minute) into the sputtering chamber until the pressure in the sputtering chamber reaches the ignition pressure of 0.3Pa required for sputtering, and then control...

Embodiment 3

[0033] With above-mentioned embodiment 2, its difference is: in the preparation process alloy Sb 2 Te 3 The sputtering power of the target is controlled to 80W, and the sputtering power of the Zn single target is controlled to 0W, and the Sb 2 Te 3 Phase change memory thin film material.

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Abstract

The invention discloses a Zn-Sb-Te phase change storage thin-film material for a phase change memory and a preparation method of the Zn-Sb-Te phase change storage thin-film material. The Zn-Sb-Te phase change storage thin-film material is characterized in that the material is made of three elements of Zn, Sb and Te, and the chemical structural formula of the material is ZnX (Sb2Te3)(100-X), wherein 0<x<40. The preparation process comprises the steps as follows: a zinc elemental target is mounted into a magnetic control direct current sputtering target, and an Sb2Te3 target is mounted into a magnetic control radio-frequency sputtering target; a sputtering chamber is subjected to vacuum pumping treatment until the vacuum degree inside the chamber reaches 1.6*10<-4> Pa, and then high-purity argon is fed into the sputtering chamber until the air pressure reaches 0.3 Pa; and the sputtering power of the zinc target is controlled to be 0-10 W, the sputtering power of the Sb2Te3 target is controlled to be 60-100 W, and a coating is sputtered for 200 seconds at a room temperature. The Zn-Sb-Te phase change storage thin-film material has the advantages of high crystallization speed, high crystallization temperature, lower melting point, higher crystalline state resistivity, better data retentivity and capability of stably working at high temperatures.

Description

technical field [0001] The invention relates to the technical field of phase-change storage materials, in particular to a Zn-Sb-Te phase-change storage thin film material for phase-change storage and a preparation method thereof. Background technique [0002] Phase Change Random Access Memory (PRAM), also known as Ovshinsky Electric Effect Unified Memory, is based on the Ovshinsky Electric Effect memory proposed by American Ovshinsky in the late 1960s. The storage media of this type of memory are many Chalcogenide compounds are the main ones, which can achieve reversible phase transitions under thermal induction, that is, transitions between amorphous and polycrystalline. In the research and development of PRAM, the phase change material as a storage medium is the core of pulse code modulation (PCM), and its performance optimization is crucial to improving the performance of PRAM devices. Mainstream phase change materials Te-based chalcogenides used in PRAM include Sb-Te, G...

Claims

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Application Information

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IPC IPC(8): H01L45/00C22C12/00
Inventor 沈祥王国祥聂秋华陈益敏李军建徐铁峰戴世勋吕业刚
Owner NINGBO UNIV
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