Electronic device applied in EUV (Extreme Ultraviolet) vacuum environment

A vacuum environment and electronics technology, applied in the field of semiconductors, can solve problems such as pollution of electronic devices, achieve effective work, ensure transmission efficiency, and reduce pollution
CN103268058BActive Publication Date: 2015-04-29ZHONGKE JINGYUAN ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
ZHONGKE JINGYUAN ELECTRON LTD
Publication Date
2015-04-29

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Abstract

The invention discloses an electronic device applied in an EUV (Extreme Ultraviolet) vacuum environment. The electronic device is located in a vacuum cavity, wherein the vacuum cavity is used for providing a EUV light survival environment, and the electronic device comprises an electronic system, wherein the electronic system is located in the vacuum cavity, and the electronic system is used for realizing the electronic functions of a EUV photoetching system; and a sealing shell, wherein the sealing shell is located in the vacuum cavity, and the sealing shell is used for sealing the electronic system and preventing pollutants formed by the electronic system from entering the vacuum cavity. The device is capable of effectively preventing the pollutants formed by the electronic system from entering the vacuum cavity, reducing pollution on the EUV vacuum environment and ensuring the transmission efficiency of EUV light; and a temperature controller and a heat conduction element are used for controlling the temperature of the electronic system in the sealing shell to ensure the normal work of the electronic system.
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Description

technical field

[0001] The invention relates to the technical field of semiconductors, in particular to an electronic device in an EUV vacuum environment. Background technique

[0002] Due to the increasingly high integration requirements of the semiconductor industry for integrated circuits (IC, Integrated Circuits), traditional visible light or ultraviolet lithography machines can no longer meet the development needs of the industry, and the market needs lithography equipment with better performance to maintain the entire industry. rapid development momentum. It is well known that the lithographic resolution is inversely proportional to the numerical aperture of the projection objective and directly proportional to the exposure wavelength. Therefore, in order to improve the resolution of lithography, the next generation of lithography machines will use shorter wavelength extreme ultraviolet light (EUV, extreme ultra violet) to replace the existing visible light and ultrav...

Claims

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