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Block copolymer and methods relating thereto

A technology of block copolymers and diblock copolymers, which can be used in other household appliances, devices for coating liquid on surfaces, coatings, etc., and can solve the problems of block copolymer orientation control and long-range order difficulties

Active Publication Date: 2013-09-11
ROHM & HAAS ELECTRONICS MATERIALS LLC +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These limitations create important challenges in the production of features with a critical dimension (CD) of <50nm
The use of conventional block copolymers presents difficulties in orientation control and long-range order during self-assembly

Method used

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  • Block copolymer and methods relating thereto
  • Block copolymer and methods relating thereto
  • Block copolymer and methods relating thereto

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] Example 1: Preparation of hydroxyl-terminated polyethylene brushes

[0054] Cyclohexane (1500 g) was added in a 2 liter glass reactor under nitrogen atmosphere. Styrene (50.34 g) was then added to the reactor via cannula. The contents of the reactor were then heated to 40°C. A solution of sec-butyllithium (19.18 g) diluted at 0.32 M in cyclohexane was then added rapidly to the reactor via cannula, causing the contents of the reactor to turn yellow. The contents of the reactor were stirred for 30 minutes. The reactor contents were then cooled to 30°C. Ethylene oxide (0.73 g) was then sent to the reactor. The contents of the reactor were stirred for 15 minutes. 20 mL of a 1.4 M solution of HCl in methanol was then added to the reactor. The polymer in the reactor was then isolated by precipitation in isopropanol at a ratio of 500 mL polymer solution / 1250 mL isopropanol. The resulting precipitate was then filtered and dried in a vacuum oven at 60°C overnight to yie...

Embodiment 2

[0057] Embodiment 2: prepare PMMA-b-PTMSMMA diblock copolymer

[0058] In a 500 mL 3 neck round bottom reactor under argon atmosphere was added tetrahydrofuran ("THF") (113 g). The THF was then cooled to -78°C in the reactor. A 0.36M solution of sec-butyllithium in cyclohexane was then titrated into the reactor contents until the reactor contents exhibited a solid pale yellow color. The contents of the reactor were then warmed and held at 30°C until the color of the material disappeared completely (approximately 10-15 minutes). 1,1-Diphenylethylene (0.116 g) diluted in cyclohexane (2.278 g) was then cannulated into the reactor. The reactor contents were then cooled to -78°C. Sec-butyllithium (6.15 g) diluted at 0.065 M in cyclohexane was then rapidly added to the reactor via cannula, causing the contents of the reactor to turn a deep ruby ​​red color. The contents of the reactor were stirred for 10 minutes. Methyl methacrylate (11.53 g) in cyclohexane (5.31 g) was then ...

Embodiment 3

[0059] Embodiment 3: prepare PMMA-b-PTMSMMA diblock copolymer

[0060]In a 500 mL 3 neck round bottom reactor under argon atmosphere was added tetrahydrofuran ("THF") (142 g). The THF was then cooled to -78°C in the reactor. A 0.36M solution of sec-butyllithium in cyclohexane was then titrated into the reactor contents until the reactor contents exhibited a solid pale yellow color. The contents of the reactor were then warmed and held at 30°C until the color of the material disappeared completely (approximately 10-15 minutes). 1,1-Diphenylethylene (0.086 g) diluted in cyclohexane (1.63 g) was then cannulated into the reactor. The reactor contents were then cooled to -78°C. Sec-butyllithium (4.5 g) diluted at 0.065 M in cyclohexane was then added rapidly to the reactor via cannula, causing the contents of the reactor to turn a deep ruby ​​red color. The contents of the reactor were stirred for 21 minutes. Methyl methacrylate (11.5 g) in cyclohexane (17.81 g) was then can...

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Abstract

A block copolymer and methods relating thereto. Provided is a copolymer composition including a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block is provided; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg / mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2.

Description

technical field [0001] The present invention relates to the present invention relates to the field of self-assembling block copolymers. In particular, the present invention is directed to specific copolymer compositions comprising block copolymers having (methyl methacrylate) blocks and poly((trimethylsilyl)methyl methacrylate) blocks. Background technique [0002] Certain block copolymers, which consist of two or more distinct homopolymer ends joined together, are known to self-assemble into periodic microdomains with feature sizes ranging from 10 nanometers to 50 nanometers (nm). The possibility of using such microdomains to pattern surfaces is of increasing interest due to the expense and difficulty of patterning at nanoscale dimensions (especially below 45 nm) using photolithography. [0003] However, controlling the lateral distribution of block copolymer microdomains on substrates remains a challenge. This problem has previously been addressed using lithographically ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L53/00C08J5/18
CPCC08F297/026B29K2995/0026B29L2031/30C09D133/12C08L33/12C08L43/04C08F220/10C08F230/08C08L53/00C08J5/18B05D3/02
Inventor E·沃格尔V·靳兹伯格张诗玮D·默里P·赫斯塔德P·特雷福纳斯
Owner ROHM & HAAS ELECTRONICS MATERIALS LLC
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