Vacuum drying device and photolithographic process

A technology of vacuum drying device and photolithography process, which is used in drying solid materials, local stirring dryers, dryers for stationary materials, etc. It is difficult to volatilize and other problems, so as to reduce exposure, improve lithography accuracy, and facilitate solvent volatilization.

CN103353209AInactive Publication Date: 2013-10-16BOE TECH GRP CO LTD +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Publication Date
2013-10-16
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to the technical field of substrate manufacture, in particular to a vacuum drying device and a photolithographic process which are used for improving the photolithographic accuracy. The disclosed vacuum drying device comprises a vacuum chamber provided with exhaust vents and a chamber door, a vacuum pumping device communicated with the exhaust vents, as well as a heating assembly arranged in the vacuum chamber. When the vacuum drying device is adopted for performing vacuum drying on a substrate coated with photoresist, heating and vacuum drying simultaneously act on the photoresist, so that less hardening film is produced, the residual quantity of a solvent in the photoresist is reduced, and the photolithographic accuracy is improved. The invention further discloses a photolithographic process which comprises steps as follows: the substrate is coated with the photoresist; and the vacuum drying device with the characteristics is adopted for performing vacuum drying and heating on the photoresist coating the substrate at the vacuum degree ranging from 26 Pa to 500 Pa at the heating temperature ranging from 30 DEG C-90 DEG C.
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Description

technical field

[0001] The invention relates to the technical field of substrate manufacturing, in particular to a vacuum drying device and a photolithography process. Background technique

[0002] At present, the pattern on the substrate is generally formed by a photolithography process. The specific process is as follows: firstly, the photoresist is coated on the substrate, and then the photoresist on the substrate is vacuum-dried. Finally, after pre-baking, exposure, and development, Form the desired pattern on the substrate.

[0003] Vacuum drying is an intermediate link in the photolithography process, which is used to remove the solvent in the photoresist. Therefore, the drying effect on the photoresist will directly affect the properties of the photoresist and the effects of subsequent exposure and development. At present, vacuum drying is generally completed in a vacuum drying device. The inventors of the present application have found that when using an existing va...

Examples

Embodiment Construction

[0026] In order to reduce the residual amount of solvent in the photoresist after vacuum drying and improve the precision of photolithography, the invention provides a vacuum drying device and a photolithography process. The glue is heated to reduce the formation of a hardened film on the surface of the photoresist, thereby reducing the residual solvent in the photoresist and improving the photolithography precision.

[0027] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0028] see figure 2 , is a schematic diagram of a vacuum drying device and its structure provided by an embodiment of the present invention. The vacuum drying device includes: a vacuum chamber 20 with an exhaust hole 21 and a door 22 , a vacuuming device (not shown in the figure) communicating with the exhaust hole 21 ...