Surface plasmon coupling terahertz quantum well detector
A technology of surface plasmons and quantum wells, which is applied in photometry, electrical components, and semiconductor devices using electric radiation detectors, can solve the problems of low responsivity and operating temperature, improve absorption efficiency, and improve device Effect of Responsivity and Operating Temperature
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Embodiment 1
[0031] Such as Figure 1a~1b As shown, the present invention provides a surface plasmon coupled terahertz quantum well detector for detection of incident photons, at least including: a semiconductor substrate 11; a lower electrode 12, combined with the semiconductor substrate 11; The quantum well structure 13, combined with the lower electrode 12, includes a plurality of stacked GaAs / (Al, Ga)As quantum wells, and the GaAs / (Al, Ga)As quantum wells are composed of GaAs layers 131 and (Al, Ga) ) As layer 132; the upper electrode 14 is combined with the multi-quantum well structure 13, and the upper electrode 14 has an electron doping concentration of 1.0×10 17 ~5.0×10 17 / cm 3 The n-type doped n-GaAs layer has a thickness of 0.2-0.6 μm; the metal grating 15, combined with the upper electrode 14, includes a plurality of metal strips arranged at intervals, and the period of the metal grating 15 is 10- 30 μm, the width of the metal strip is 5-15 μm, which is used to realize the p...
Embodiment 2
[0034] Such as Figure 1a-3 As shown, this embodiment provides a surface plasmon coupled terahertz quantum well detector for detection of incident photons, at least including: a semiconductor substrate 11; a lower electrode 12, combined with the semiconductor substrate 11; The multi-quantum well structure 13 is combined with the lower electrode 12, including a plurality of stacked GaAs / (Al, Ga)As quantum wells; the upper electrode 14 is combined with the multi-quantum well structure 13, and the upper electrode 14 is The electron doping concentration n is 5.0×1017 / cm 3 n-type doped n-GaAs layer, the thickness a of which is 0.4 μm; the metal grating 15, combined with the upper electrode 14, includes a plurality of metal strips arranged at intervals, and the period p of the metal grating 15 is 16 μm, The width s of the metal strip is 8 μm, which is used to realize the polar deflection of the incident photons, and make the incident photons interact with the electrons in the uppe...
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