Nanometer electric generator utilizing sliding friction and electricity generating method
A nano-generator, sliding friction technology, applied in the direction of triboelectric generators, etc., can solve the problems of the use of power supply components that cannot be micro-electronic devices, the structure is complex, and the size of the generator is large, and the structure is simple, small, and low-cost. Effect
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Embodiment 1
[0099] The conductive element adopts a metal copper film layer with a thickness of 100nm, the friction layer adopts a Teflon (polytetrafluoroethylene) film with a thickness of 25 microns, and the conductive layer adopts a metal aluminum film layer with a thickness of 100nm. The macroscopic dimensions of these films are 5cm×7cm. The Teflon film and the metal aluminum film are relatively completely overlapped and placed in contact. After the wire is drawn out through the metal aluminum film layer and the metal copper film layer of the above-mentioned triboelectric nanogenerator, under the relative sliding at an average speed of 0.6 m / s, the friction nano The short-circuit current output diagram generated by the generator is shown in Figure 5 . Connect the output terminal of the friction nanogenerator to the full-bridge rectifier, so that the AC current output generated by the friction nanogenerator is converted into a direct current output, and the obtained current output is s...
Embodiment 2
[0102] In this embodiment, on the basis of embodiment 1, only the polytetrafluoroethylene film is modified, and the others are the same as in embodiment 1, and will not be repeated here. Nanowire arrays were prepared by inductively coupled plasma etching on the surface of the polytetrafluoroethylene film. First, about 10 nanometers of gold was deposited on the surface of the polytetrafluoroethylene film with a sputtering device, and then the polytetrafluoroethylene film was placed in an inductor. In the coupled plasma etching machine, etch the side on which the gold is deposited, and pass O 2 , Ar and CF 4 Gas, the flow rate is controlled at 10sccm, 15sccm and 30sccm respectively, the pressure is controlled at 15mTorr, the working temperature is controlled at 55°C, the plasma is generated with a power of 400 watts, and the plasma is accelerated with a power of 100 watts for about 5 minutes of etching , to obtain a polymer polytetrafluoroethylene nanorod array with a length of...
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