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A transmission type spectroscopic grating and interference lithography system

A spectroscopic grating and transmissive technology, applied in the field of lithography, can solve the problems of manufacturing difficulty and cost increase, poor graphic quality, limited lithographic format, etc., and achieve the effect of pixelation control, simple and reliable structure, and improved graphic quality

Inactive Publication Date: 2016-01-20
SUZHOU UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

Generally suitable for optical laboratories, not for optical processing equipment
Second, the lithography format is limited
If the aperture of the beam expander is to be increased, the manufacturing difficulty and cost will increase significantly
Third, the pattern quality of the edge of the photolithographic area is poor
[0018] First: ±1 order diffraction efficiency needs to be improved
Second: Sufficient suppression of useless diffraction orders (orders 0 and above 2) cannot be achieved
Its exposure area is not easy to achieve precise splicing exposure, which limits the solution's application in large-format lithography

Method used

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  • A transmission type spectroscopic grating and interference lithography system
  • A transmission type spectroscopic grating and interference lithography system
  • A transmission type spectroscopic grating and interference lithography system

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Embodiment Construction

[0054] As mentioned in the background technology, in the existing interference lithography process, when a diffraction grating is used as a spectroscopic device, due to the defects of low diffraction efficiency of the diffraction grating and insufficient suppression of useless diffraction orders, the interference image during exposure has irregular fringes. Issues with sharpness and edge distortion.

[0055] Therefore the object of the present invention is to propose a kind of transmission type spectroscopic grating applied in the interference lithography process and the interference lithography technology using the spectroscopic grating, the transmission type spectroscopic grating can improve the ±1st order diffraction efficiency of the diffraction grating, Suppressing the diffracted light energy of other orders, especially the efficiency of 0-order light and ±2-order light, makes the ±1-order diffraction efficiency of the grating reach more than 92%, which is obviously better...

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Abstract

A transmission-type light-splitting grating and an interference photoetching system. The transmission-type light-splitting grating (1) comprises a grating groove-shaped region (11) located on an incident plane (10) and a light blocking region (12) located on the periphery of the grating groove-shaped region (11), wherein the grating groove-shaped region (11) comprises a stepped grating structure (110), and the stepped grating structure (110) is provided with a transmission step plane (111) and a non-transmission region (112). The transmission-type light-splitting grating (1) can realize the maximum modulation on light of ± 1 level, so that the beam splitting light transmitted out has the highest energy utilization rate. An interference pattern obtained via the transmission-type light-splitting grating (1) has good boundary quality, so that precise pattern splicing can be completed, thereby significantly promoting the large-breadth interference photoetching technique.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a spectroscopic grating used in the interference photolithography technology and an interference photolithography system formed by using the spectroscopic grating. Background technique [0002] Interference lithography is an important branch of lithography, which has received extensive attention in recent years. The main advantage of interference lithography is the high pattern resolution that can be achieved. When the wavelength λ and numerical aperture NA of the optical system are fixed, the minimum linewidth that the interference optical system can obtain is λ / (4NA), which is 1 / 2 of the ordinary projection imaging optical system. In addition, the optical path of interference lithography is simple, and the pattern produced has accurate cycle and good uniformity. [0003] There are two typical optical path schemes in interference lithography. Optical path scheme one ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G03F7/20
CPCG02B27/1086G02B5/1842G02B5/1866G03F7/70408
Inventor 胡进浦东林陈林森
Owner SUZHOU UNIV