Method for cleaning solar cell silicon wafer after polishing
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 昊诚光电(太仓)有限公司
- Publication Date
- 2013-12-11
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for preparing a silicon wafer of a battery, and more particularly to a method for cleaning a silicon wafer of a solar battery after polishing. Background technique
[0002] Solar cells have developed from the initial immaturity to the current mature crystalline silicon cell technology. With the continuous emergence of various high-efficiency cells, not only the technology and materials are constantly being innovated, but also the technology is constantly innovating. Compared with the production process, the preparation process of the crystalline silicon solar cell structure in the back electric field area in the laboratory is not only high in production cost, but also complicated and cumbersome, and has not yet been applied to commercial production on a large scale. The main difference between the crystalline silicon battery in contact with the back electric field area and the ordinary crystalline silicon battery is th...