Analysis method for determining titanium, vanadium, tungsten, manganese and silicon in K25 chromium-base high temperature alloy
A technology of superalloy, titanium vanadium, applied in the field of alloy constant element analysis, can solve the problems of incomplete dissolution, long analysis period, long time for dissolving samples, etc.
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Embodiment 1
[0072] To measure the content of titanium, vanadium, tungsten, manganese and silicon in K25 chromium-based superalloy, an inductively coupled plasma emission spectrometer is used. The working conditions and analysis lines of the instrument are as follows: high frequency frequency: 40.68MHz; incident power: 0.95~1.1Kw ;Reflected power: <15W; Cooling air flow: 12~20L / min; Sheath air flow: 0.1~0.6L / min; Sample lift: 1.0~1.5ml / min; Integration time: 1~10s; : Titanium 334.941nm; Vanadium 292.402nm; Tungsten 207.911nm; Manganese 257.610nm; Silicon 288.158nm or 251.611nm;
[0073] (1) The reagents used in the determination process are as follows:
[0074] (1.1) Hydrochloric acid, ρ1.19g / mL; superior grade;
[0075] (1.2) Nitric acid, ρ1.42g / mL; superior grade;
[0076] (1.3) Sulfuric acid, ρ1.84g / mL; superior grade;
[0077] (1.4) Hydrofluoric acid, ρ1.15g / mL, superior grade;
[0078] (1.5) sulfuric acid, 1+1;
[0079] (1.6) Nitric acid, 1+1;
Embodiment 2
[0120] To measure the content of titanium, vanadium, tungsten, manganese and silicon in K25 chromium-based superalloy, an inductively coupled plasma emission spectrometer is used. The working conditions and analysis lines of the instrument are as follows: high frequency frequency: 40.68MHz; incident power: 0.95~1.1Kw ;Reflected power: <15W; Cooling air flow: 12~20L / min; Sheath air flow: 0.1~0.6L / min; Sample lift: 1.0~1.5ml / min; Integration time: 1~10s; : Titanium 334.941nm; Vanadium 292.402nm; Tungsten 207.911nm; Manganese 257.610nm; Silicon 288.158nm or 251.611nm;
[0121] (1) The reagents used in the determination process are as follows:
[0122] (1.1) Hydrochloric acid, ρ1.19g / mL; superior grade;
[0123] (1.2) Nitric acid, ρ1.42g / mL; superior grade;
[0124] (1.3) Sulfuric acid, ρ1.84g / mL; superior grade;
[0125] (1.4) Hydrofluoric acid, ρ1.15g / mL, superior grade;
[0126] (1.5) sulfuric acid, 1+1;
[0127] (1.6) Nitric acid, 1+1;
Embodiment 3
[0162] To measure the content of titanium, vanadium, tungsten, manganese and silicon in K25 chromium-based superalloy, an inductively coupled plasma emission spectrometer is used. The working conditions and analysis lines of the instrument are as follows: high frequency frequency: 40.68MHz; incident power: 0.95~1.1Kw ;Reflected power: <15W; Cooling air flow: 12~20L / min; Sheath air flow: 0.1~0.6L / min; Sample lift: 1.0~1.5ml / min; Integration time: 1~10s; : Titanium 334.941nm; Vanadium 292.402nm; Tungsten 207.911nm; Manganese 257.610nm; Silicon 288.158nm or 251.611nm;
[0163] (1) The reagents used in the determination process are as follows:
[0164] (1.1) Hydrochloric acid, ρ1.19g / mL; superior grade;
[0165] (1.2) Nitric acid, ρ1.42g / mL; superior grade;
[0166] (1.3) Sulfuric acid, ρ1.84g / mL; superior grade;
[0167] (1.4) Hydrofluoric acid, ρ1.15g / mL, superior grade;
[0168] (1.5) sulfuric acid, 1+1;
[0169] (1.6) Nitric acid, 1+1;
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