Vacuum reaction chamber and vacuum processing equipment

Abstract

The invention discloses vacuum reaction chamber and vacuum processing equipment. The vacuum chamber comprises a plurality of wallboards, wherein an observation device is arranged on at least one wall boards of the plurality of wallboards; the observation device comprises an observation window arranged on the wallboard and a shielding plate for shielding the observation window; the shielding plate can be moved between a first position for shielding the observation window and a second position not shielding the observation window. The vacuum processing equipment comprises the vacuum reaction chamber. In the vacuum reaction chamber and the vacuum processing equipment, the shielding plate can protect the observation window and further effectively shield the wallboard around the observation window. The vacuum reaction chamber and the vacuum processing equipment can effectively protect the observation window, prolongs the service life of the observation window, and effectively ensures the observation effect; meantime, the shielding plate can protect the wallboard around the observation window, namely the etched place with highest etching possibility on the wallboard, so as to prolong the entire service life of the wallboard and reduce the cost for high-frequency maintenance and labor loss.

Description

technical field [0001] The invention relates to vacuum etching and vacuum coating equipment in the photovoltaic industry, semiconductor industry, and liquid crystal panel industry, in particular to a vacuum reaction chamber and vacuum processing equipment. Background technique [0002] Vacuum reaction chambers in vacuum etching equipment or vacuum coating equipment often used in the photovoltaic industry, semiconductor, and liquid crystal panel industries are generally made of opaque metal materials. This kind of vacuum reaction chamber is generally equipped with an observation window made of transparent quartz glass, so that the operator can observe the internal conditions of the vacuum equipment when the production is abnormal or when monitoring for some purpose. [0003] The observation windows of existing vacuum processing equipment do not include protection facilities, which results in long-term exposure of the observation windows to the process reaction environment. Af...

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Problems solved by technology

[0003] The observation windows of existing vacuum processing equipment do not include protective facilities, which results in long-term exposure of the observation windows to the process reaction environment. After a period of time, the observation windows cannot be used normally due to glass atomization, and have to be replaced regularly, wasting a lot Manpower, material resources, and indirectly reduce the utilization rate of equipment; and part of the reaction requires the operator to detect the spectrum of reactants and products through the observation window to control the reaction time. Since the observation window is atomized by plasma, the spectrum detection is inaccurate And further lead to insufficient etching, which seriously affects product quality; on the other hand, the inner wall plate of the vacuum reaction chamber will be etched by the plasma and reactants during the etching process, resulting in the loss of the inner wall plate oxide layer, and the inner wall plate is conductive. It greatly shortens the service life of the inner wall panels, wasting a lot of money, and at the same time the replacement of the wall panels also wastes manpower, reduces the utilization rate of equipment, and affects production efficiency

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