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A Cyclotron Beam Measuring Device

A technology of cyclotron and measuring device, which is applied in the direction of measuring device, radiation measurement, X/γ/cosmic radiation measurement, etc., can solve the problems such as difficulty in adjusting the intensity of the peeling target current, and achieve fast judgment and problem solving, simple device, The effect of improved maintenance ability

Active Publication Date: 2016-06-08
SHANGHAI ATOM KEXING PHARMA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because there are only two beam measurement points for injection into the Faraday cup and the stripping target, it is difficult to distinguish whether the problem is caused by the axial injection line or the vacuum chamber, making it extremely difficult to adjust the upstream flow intensity of the stripping target

Method used

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  • A Cyclotron Beam Measuring Device
  • A Cyclotron Beam Measuring Device
  • A Cyclotron Beam Measuring Device

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Embodiment

[0022] A cyclotron beam measuring device, the beam measuring device is arranged on the existing cyclotron, the existing cyclotron includes an ion source and an axial injection system, an acceleration cavity and a target system, the acceleration cavity is as figure 1 As shown, it includes a magnetic field system, a high frequency system, a stripping system, a central area, and a main vacuum system. The magnetic field system includes a magnet 9 arranged in the acceleration cavity wall 8. The high frequency system includes two radio frequency D boxes 3, two radio frequency One end of the D box 3 is provided with a tuning capacitor 4 and a coupling capacitor 5 at the end of the other radio frequency D box. The coupling capacitor 5 is connected to the radio frequency final stage power amplifier 6, and the central area is provided with a central area deflection plate 1 , The central area deflection plate 1 is provided with symmetrical radio frequency D boxes 3 on both sides, there are ...

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Abstract

The invention relates to a cyclotron beam measuring device. The beam measuring device is arranged on a cyclotron. The cyclotron comprises an ion source and axial injection system, an accelerating cavity and a target system. The accelerating cavity comprises a magnetic field system, a high-frequency system, a stripping system, a central region, and a main vacuum system. The central region is provided with a central region deflecting plate. Two sides of the central region deflecting plate are provided with symmetrical radio-frequency D boxes. The target system comprises a stripping target, a converter box, a PLC controller and a computer which are connected with the stripping target successively. The measuring device is a U-shaped copper plate. The U-shaped copper plate is arranged at the outlet of the central region deflecting plate, one end of the U-shaped copper plate is connected with the stripping target through a measuring line, signals on the stripping target are received through the converter box so as to be sent to the PLC controller and then transmitted to the computer, and the beam strength at the U-shaped copper plate is detected. Compared with the prior art, the device of the invention has advantages, such as simple and practical device, etc.

Description

Technical field [0001] The invention relates to a cyclotron beam measuring device. Background technique [0002] The existing cyclotron is a fixed-frequency cyclotron that accelerates negative hydrogen ions (H-) to a fixed magnetic field of 30 MeV. By positioning the glass film at a radius corresponding to the energy requirement, the beam energy can be changed from 15 MeV to 30 MeV. The structure of the existing cyclotron includes three parts: (1) ion source and axial injection, ion source-deflection plate: ion source is a device that ionizes neutral atoms or molecules and draws ion beams from it. The ion source has The following main components are composed: ion source arc cavity (plasma discharge chamber wall), top cover, magnetic filter, suction pole device, suction pole compensation device. The pipeline between the accelerator and the ion source is called the axial injection line. The ion beam generated in the ion source is accelerated along the axial injection line into t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01T1/29
Inventor 徐建波
Owner SHANGHAI ATOM KEXING PHARMA