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A kind of niobium tubular target material and its production method

A production method and niobium tubular technology are applied in the field of niobium tubular targets and their production, which can solve the problems of difficulty in forming niobium tubular targets, hindering the fluidity of niobium metal, and affecting the extrusion quality of the tube surface.

Active Publication Date: 2017-04-19
NINGXIA ORIENT TANTALUM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the process of preparing the niobium tubular target in the above method, the outer surface of the niobium tube billet is sealed with a sheath material, and then the hot extrusion process is carried out. The variable speed is inconsistent, and the fluidity of the niobium metal is hindered by friction in the extrusion barrel, and it is adhered to the niobium metal, which affects the extrusion quality of the pipe surface, and during the extrusion process, the lubricity of the ladle sleeve is poor, so that It is difficult to form niobium tubular target

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] 1) Turning the niobium ingot with a lathe, turning its outer surface and both ends, and drilling the center Φ45mm hole after removing defects, and then boring. The final size is: a niobium tube blank with an outer diameter of Φ235mm, an inner diameter of 100mm, a length of 365mm, and a chamfered outer angle of 30mm×45° at one end;

[0038] 2) Use an intermediate frequency furnace to preheat the niobium tube blank obtained in step 1). The preheating temperature is 900°C. After preheating, spray glass powder on the inner and outer surfaces and both ends of the niobium tube blank;

[0039] 3) Transfer the niobium ingot obtained in step 2) to a secondary intermediate frequency induction furnace for secondary heating at a heating temperature of 1050°C and keep it warm for 10 minutes;

[0040] 4) The niobium tube blank obtained in step 3) is sprayed with glass powder for the second time, and the thickness of the glass powder is controlled to 1.5mm to ensure uniform spraying w...

Embodiment 2

[0046] 1) Turning the niobium ingot with a lathe, turning its outer surface and both ends, and drilling the center Φ45mm hole after removing defects, and then boring. The final size is: a niobium tube blank with an outer diameter of Φ255mm, an inner diameter of 120mm, a length of 460mm, and a chamfered outer angle of 30mm×45° at one end;

[0047] 2) Use an intermediate frequency furnace to preheat the niobium tube blank obtained in step 1), the preheating temperature is 900 °C, and spray glass powder on the inner and outer surfaces and both ends of the niobium tube blank after preheating;

[0048] 3) Transfer the niobium tube billet obtained in step 2) to a secondary intermediate frequency induction furnace for secondary heating at a heating temperature of 1050°C for 10 minutes;

[0049] 4) The niobium tube blank obtained in step 3) is sprayed with glass powder for the second time, and the thickness of the glass powder is controlled between 1 and 2 mm to ensure that the sprayi...

Embodiment 3

[0055] 1) Turning the niobium ingot with a lathe, turning its outer surface and both ends, and drilling the center Φ45mm hole after removing defects, and then boring. The final size is: a niobium tube blank with an outer diameter of Φ284mm, an inner diameter of 130mm, a length of 650mm, and a chamfered outer angle of 30mm×45° at one end;

[0056] 2) Use an intermediate frequency furnace to preheat the niobium tube blank obtained in step 1, the preheating temperature is 950°C, and spray glass powder on the inner and outer surfaces and both ends of the niobium tube blank after preheating;

[0057] 3) Transfer the niobium tube blank obtained in step 2) to a secondary intermediate frequency induction furnace for secondary heating at a heating temperature of 1100°C and keep it warm for 10 minutes;

[0058] 4) The niobium tube blank obtained in step 3) is sprayed with glass powder for the second time, and the thickness of the glass powder is controlled between 1 and 2 mm to ensure t...

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Abstract

The invention provides a producing method of a niobium tubular target material, and the producing method comprises the following steps: first heating a niobium tube blank; then first spraying the heated niobium tube blank surface with glass powder; performing hot extrusion on the niobium tube blank sprayed with the glass powder; performing acid pickling on the hot-extruded niobium tube blank; and performing heat treatment on the acid pickled niobium tube blank to obtain the niobium tubular target material. According to the method, the niobium tube blank surface is sprayed with the glass powder, and due to the smaller thermal-conductivity coefficient of the glass powder, the glass powder existing between contact surfaces of the niobium tube blank and an extrusion machine work die forms a heat-insulation anti-oxidation layer, so that the niobium tube blank is easy to mold; on the other hand, the niobium tube blank surface is sprayed with the glass powder, a good lubrication effect is exhibited in the extrusion process, and the niobium tube blank surface and die adhesion problem can be avoided, so that the niobium tube blank surface quality is good; and due to the lubrication effect of the glass powder, the niobium tubular target material is easy to mold by extrusion. The invention also provides the niobium tubular target.

Description

technical field [0001] The invention relates to the technical field of target material production, in particular to a niobium tubular target material and a production method thereof. Background technique [0002] The target is the material used as the cathode in the sputtering deposition technique, which can be separated from the cathode in the form of molecules, atoms or ions under the impact of positively charged cations and redeposited on the surface of the anode. As a special electronic material with high added value, the target is widely used as a thin film material for sputtering cutting-edge technology. According to the application, the targets mainly include targets for the semiconductor field, targets for recording media, targets for display films, advanced touch screens and displays, optical targets and superconducting targets, etc. [0003] Magnetron sputtering is one of the main technologies for preparing thin film materials. It uses ion sources to generate ions...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34B21C23/08C22F1/18
Inventor 钟景明汪凯李兆博许宁郭从喜任晓
Owner NINGXIA ORIENT TANTALUM IND