Semiconductor device based on graphene electrode and manufacturing method thereof
A graphene electrode and semiconductor technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as separation or falling off, technical obstacles, and affect device performance, and achieve the effects of graphic optimization, current distribution improvement, and electrical performance improvement
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Embodiment 1
[0022] In this example, see figure 1 and figure 2 , a semiconductor device based on a graphene electrode, which is sequentially formed by combining a substrate layer 6, a first semiconductor layer 5, an active layer 4, a second semiconductor layer 3, and a graphene electrode layer 2, and the reinforcing electrode 1 is made of gold electrode, the substrate layer 6 is sapphire, the first semiconductor layer 5 is N-type gallium nitride, and the second semiconductor layer 3 is P-type gallium nitride, so that the gold electrode is fixedly combined with the graphene electrode layer 2 by pinning and fixing. On the P-type gallium nitride, the graphene electrode layer 2 is penetrated by the gold electrode, and one end of the gold electrode is directly contacted and fixedly connected with the P-type gallium nitride, so that the other end of the gold electrode connects the graphene The electrode layer 2 is pressed and fixed on the P-type gallium nitride, and the gold electrode and the ...
Embodiment 2
[0030] This embodiment is basically the same as Embodiment 1, especially in that:
[0031] In this example, see image 3 , a semiconductor device based on a graphene electrode, which is sequentially formed by combining a substrate layer 6, a first semiconductor layer 5, an active layer 4, a second semiconductor layer 3, and a graphene electrode layer 2, and the reinforcing electrode 1 is made of ITO / ZnO Form an ITO / ZnO electrode, the substrate layer 6 is SiC, the first semiconductor layer 5 is N-type gallium nitride, and the second semiconductor layer 3 is P-type gallium nitride, so that the ITO / ZnO electrode is fixed by pinning and bonding the graphene The electrode layer 2 is fixedly combined on the P-type gallium nitride, that is, the graphene electrode layer 2 is penetrated by the ITO / ZnO electrode, and one end of the ITO / ZnO electrode is directly contacted and fixedly connected with the P-type gallium nitride, so that The other end of the ITO / ZnO electrode presses and fi...
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