Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Pink gold target for vacuum magnetron sputtering and preparation method thereof

A vacuum magnetron sputtering, pink technology, applied in the direction of sputtering coating, vacuum evaporation coating, metal material coating process, etc., to achieve the effect of high surface hardness, uniform color, good oxidation resistance and anti-sulfurization

Active Publication Date: 2014-07-23
沈阳东创贵金属材料有限公司
View PDF7 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a pink gold target for vacuum magnetron sputtering and its preparation method in response to the current market demand for pink gold coatings. Through the addition of different alloy elements and changes in its composition, the into a pink gold target with good oxidation resistance and wear resistance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Prepare Au according to the ratio, Pd, Fe, Cu, Cr and In as raw materials; heat and melt Au, then put Pd into the melted Au, when Au and Pd melt together, add Fe, Cu to the AuPd melt in turn , Cr and In;

[0026] When all the metal is melted, stir the metal melt evenly, then heat it to 1200~1300℃, keep it warm for 3~5min for refining;

[0027] Pour the refined metal melt into a mold preheated to 100~150°C, and air cool to room temperature to obtain a slab;

[0028] The slab is milled, rolled, annealed, sheared and leveled to make a pink gold target for vacuum magnetron sputtering. The composition contains Au 85.0%, Pd 6.5%, Fe 3.0% by weight, Cu 2.5%, Cr 2.5%, In 0.5%, chroma value range: a*=2.7, b*=12.9.

Embodiment 2

[0030] Prepare Au according to the ratio, Pd, Fe, Cu, Cr and In as raw materials; heat and melt Au, then put Pd into the melted Au, when Au and Pd melt together, add Fe, Cu to the AuPd melt in turn , Cr and In;

[0031] When all the metal is melted, stir the metal melt evenly, then heat it to 1200~1300℃, keep it warm for 3~5min for refining;

[0032] Pour the refined metal melt into a mold preheated to 100~150°C, and air cool to room temperature to obtain a slab;

[0033] The billet is milled, rolled, annealed, sheared and leveled to make a pink gold target for vacuum magnetron sputtering. The composition contains Au 88.0%, Pd 5.5%, Fe 2.5% by weight, Cu 2.0%, Cr 1.0%, In 1.0%, chroma value range: a*=2.9, b*=13.2.

Embodiment 3

[0035] Prepare Au according to the ratio, Pd, Fe, Cu, Cr and In as raw materials; heat and melt Au, then put Pd into the melted Au, when Au and Pd melt together, add Fe, Cu to the AuPd melt in turn , Cr and In;

[0036] When all the metal is melted, stir the metal melt evenly, then heat it to 1200~1300℃, keep it warm for 3~5min for refining;

[0037] Pour the refined metal melt into a mold preheated to 100~150°C, and air cool to room temperature to obtain a slab;

[0038] The slab is milled, rolled, annealed, sheared and leveled to make a pink gold target for vacuum magnetron sputtering. The composition contains Au 90.0%, Pd 4.5%, Fe 2.0% by weight, Cu 1.5%, Cr 1.5%, In 0.5%, chroma value range: a*=3.6, b*=14.5.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a pink gold target for vacuum magnetron sputtering and a preparation method thereof, and belongs to the technical field of non-ferrous metallurgy. The pink gold target for vacuum magnetron sputtering comprises the following components in percentage by weight: 82.0-95.0% of Au, 0.5-7.0% of Pd, 0.3-4.0% of Fe, 0.5-3.0% of Cu, 0.1-3.0% of Cr and 0.05-1.0% of In. The preparation method comprises the following steps: (1) preparing raw materials, namely heating the Au and melting, putting Pd into the molten Au, mutually melting and adding Fe, Cu, Cr and In sequentially; (2) stirring the molten metal uniformly, and then heating to 1200-1300 DEG C, maintaining the temperature for 3-5 minutes and refining; (3) pouring into a preheated mold and air-cooling to room temperature to obtain casting blanks; (4) face milling, rolling, annealing, cutting and leveling. The pink gold target, disclosed by the invention, is applied in the coating technology to obtain a pink film layer with the characteristics of uniform color, good oxidation resistance and vulcanization resistance, high surface hardness and good wear resistance and has broad application prospects.

Description

technical field [0001] The invention belongs to the technical field of nonferrous metal metallurgy, in particular to a pink gold target material for vacuum magnetron sputtering and a preparation method thereof. Background technique [0002] Gold has become an important ornament and decorative material because of its brilliant color and high value. Because of its soft texture, it is easy to deform, scratch and break during use, so its wide application is limited. With the development of science and technology, people have researched and developed gold alloys according to the requirements for the durability and color versatility of ornaments and decorative materials, and gradually replaced the traditional vacuum magnetron sputtering coating technology in terms of surface decoration gold-based materials. The process of hydroelectroplating gold-plated alloy products. Pink gold (local tyrant gold) has fashionable and bright colors, and has been favored by consumers recently, so ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/35C23C14/14C22C5/02C22C1/02
Inventor 赵宏达刘革于志凯
Owner 沈阳东创贵金属材料有限公司
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com