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Chlorosilane purification system

A technology of chlorosilane and rectification tower, which is applied in the field of chlorosilane purification system to achieve the effect of solving high energy consumption, reducing production cost and achieving obvious effects

Active Publication Date: 2014-07-30
CHINA ENFI ENGINEERING CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the current system for purifying chlorosilanes needs further improvement

Method used

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  • Chlorosilane purification system
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  • Chlorosilane purification system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0074] Same process image 3 , the tower feed volume is 20m 3 / h, the feed composition is as follows: the mass content of trichlorosilane is 98%, silicon tetrachloride and dichlorodihydrosilane are both 1%, and metal impurities such as B, P, and Fe are trace amounts.

[0075] The raw material first enters the first rectification tower T1, and the material flow is from the first rectification tower T1 to the fifth rectification tower T5, wherein the pressures of the first rectification tower T1 to the fifth rectification tower T5 increase sequentially.

[0076] The top pressure and temperature of the first rectification tower are 0.25MPa (absolute pressure) and 54.9°C respectively, ensuring that the cooling source of the top of the first rectification tower (that is, the tower with the lowest pressure) is circulating water; the fifth rectification tower The temperature of the bottom of the tower should be lower than 120°C, to ensure that the heat source of the fifth rectificat...

Embodiment 2

[0082] Same process Figure 4 , the tower feed volume is 20m 3 / h, the feed composition is as follows: the mass content of trichlorosilane is 98%, silicon tetrachloride and dichlorodihydrosilane are both 0.1%, and metal impurities such as B, P, and Fe are trace amounts.

[0083] The raw material first enters the fifth rectification tower T5, and the material flow is from the fifth rectification tower T5 to the first rectification tower T1, wherein the pressure from the fifth rectification tower T5 to the first rectification tower T1 decreases sequentially.

[0084] The pressure and temperature at the top of the first rectification tower are 0.25MPa (absolute pressure) and 54.9°C respectively, ensuring that the cooling source at the top of the first rectification tower (that is, the tower with the lowest pressure) is circulating water; the fifth rectification tower The temperature of the bottom of the tower should be lower than 120°C, to ensure that the heat source of the fift...

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Abstract

The invention discloses a chlorosilane purification system. The system comprises: first to fifth rectifying towers, wherein each of the first to fifth rectifying towers has a material inlet, a gas outlet, a liquid outlet, a liquid inlet and a gas inlet; first to fifth reboilers, wherein each of the first to fifth reboilers has a liquid inlet, a gas outlet, a steam inlet and a condensate liquid outlet; first to fifth reflux pumps; and a condenser. Compared with simple coupled rectification technologies, the above five tower continuous coupling method has a more obvious energy saving effect, enables the energy consumption to be reduced by 80%, and solves a problem that energy consumed by a purification process of a polysilicon system is high, so the production cost is reduced.

Description

technical field [0001] The invention relates to the field of polysilicon, in particular, the invention relates to a chlorosilane purification system. Background technique [0002] Polysilicon is an ultra-high-purity material used in integrated circuits, electronic devices and solar cells. It is the cornerstone of the information and new energy industries. It is a strategic material that the country encourages and gives priority to development. It is also a product and industry that the country encourages the development of. In 2012, affected by the global economic crisis and EU anti-dumping measures, the polysilicon market continued to slump. How to reduce polysilicon production costs and how to enhance the core competitiveness of enterprises has become the primary task for the long-term sustainable development of polysilicon enterprises. [0003] At present, the main production method of polysilicon in China is the improved Siemens method, which mainly includes five process...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCY02P20/10
Inventor 姜利霞严大洲杨永亮赵雄肖荣晖汤传斌
Owner CHINA ENFI ENGINEERING CORPORATION
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