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Chemically amplified i-line positive photoresist composition containing diphenol acetal polymer

A photoresist and acetal polymer technology is applied in the field of offset printing ultraviolet photosensitive computer-to-plate imaging materials and chemically amplified i-line positive photoresist compositions, and can solve the problem of low resolution, Can not meet the high resolution and high sensitivity, low sensitivity and other issues

Inactive Publication Date: 2014-12-03
HANDAN DEV ZONE LIYE CHEM
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  • Application Information

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Problems solved by technology

But its disadvantage is that the sensitivity is low, which is 100-300mJ / cm 2 , and due to the wide molecular weight distribution of phenolic resin, the resolution of this system is low, so it cannot meet the high-resolution and high-sensitivity requirements of high-end i-line lithography for photoresist materials

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  • Chemically amplified i-line positive photoresist composition containing diphenol acetal polymer
  • Chemically amplified i-line positive photoresist composition containing diphenol acetal polymer
  • Chemically amplified i-line positive photoresist composition containing diphenol acetal polymer

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Embodiment Construction

[0016] The invention relates to a chemically amplified i-line positive photoresist composed of diphenol divinyl ether acetal polymer, 2,1,4-diazonaphthoquinone sulfonate photosensitive agent and phenolic resin etchant material. It is formed by dissolving acetal polymer (A), photosensitive agent (B) which can generate sulfonic acid by exposure, film-forming resin (C) and other additives (D) into organic solvent (E) in a certain proportion . After the photosensitive film layer is exposed, the photosensitive compound in it decomposes to produce a small amount of sulfonic acid, and after a short period of heating, the acid-induced decomposition of the acetal polymer is quickly realized, so that the exposed area is soluble in alkaline water, not The exposed area is insoluble, and the positive image is finally obtained after developing with dilute alkaline water.

[0017] (A) Diphenol divinyl ether acetal polymer

[0018] The diphenol divinyl ether acetal polymer shown in the fol...

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Abstract

The invention relates to a novel chemically amplified i-line positive photoresist composition which mainly comprises (A) a diphenol divinyl ether acetal polymer obtained by reaction of a diphenol compound with various divinyl ether compounds, wherein the acetal polymer is easily subjected to acid-induced decomposition reaction; (B) a 2,1,4-diazo naphthoquinone sulfonate photosensitizer obtained by esterifying 2,1,4-diazo naphthoquinone sulfonyl chloride and a phenolic compound, wherein the photosensitizer can generate a small amount of sulfonic acid under illumination and cause acidolysis of the acetal polymer and also can serve as a photo-acid generator; and (C) a phenolic resin. The chemically amplified i-line positive light-sensitive imaging material has the advantages of high sensitivity, high resolution ratio, high transparency and the like and can be used for near ultraviolet photoresists and offset print ultraviolet light-sensitive computer-to-plate (CTP) imaging materials for semiconductor processing.

Description

technical field [0001] The technical field to which the invention belongs is the field of polymer photosensitive imaging materials. Specifically, the present invention relates to a novel chemically amplified i-line positive photoresist composition, and this type of novel photosensitive imaging material can be used for semiconductor processing near-ultraviolet positive photoresist (also It is called photoresist), and can also be used for offset printing of ultraviolet photosensitive computer-to-plate (CTP) imaging materials. Background technique [0002] The diazonaphthoquinone sulfonate-novolac resin system is the mainstream photoresist for i-line (365nm) lithography technology. This is a non-chemical amplification system, which is a photodecomposition photosensitive material with novolac resin as the film-forming material and diazonaphthoquinone sulfonate product as the photosensitive component. The imaging principle is that the diazo group of diazonaphthoquinone sulfonat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/039
Inventor 扬宪磊王力元
Owner HANDAN DEV ZONE LIYE CHEM
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