Electromagnetic shielding case based on micro metal grid and manufacturing method of electromagnetic shielding case

Abstract

The invention discloses an electromagnetic shielding case based on a micro metal grid and a manufacturing method of the electromagnetic shielding case. The method comprises the following steps that micro metal grid grooves are formed in a flexible substrate according to a micro-nano impressing method; the micro metal grid grooves are filled with nanometer conductive paste in a blade coating mode, and a micro metal grid conductive thin layer is formed after sintering; the micro metal grid is formed in the micro metal grid grooves after electroforming deposition; the deposited micro metal grid is stripped out of the micro metal grid grooves of the flexible substrate, so that the hollowed-out micro metal grid is formed; the hollowed-out micro metal grid is combined with a metal sheet with the same size as the hollowed-out micro metal grid, so that the combined micro metal grid is formed; the combined micro metal grid is fixed to a concave die, and the combined micro metal grid is rolled to have the same shape as the concave die; the combined micro metal grid is separated, so that the electromagnetic shielding case having the same shape as the concave die is obtained. The electromagnetic shielding case is high in manufacturing efficiency, low in cost and capable of being manufactured on a large scale.

Description

technical field [0001] The invention relates to the technical field of electromagnetic shielding of an optical tractor, in particular to an electromagnetic shielding cover based on a metal grid and a preparation method thereof. Background technique [0002] The micro metal grid is prepared on the surface of the hemispherical optical element, which can be transparent to light wavelengths (visible light to infrared light), and has an electromagnetic shielding effect on electromagnetic wave (microwave) wavelengths. Generally, this kind of electromagnetic shielding cover of micro-metal mesh can be used for electromagnetic shielding of the hemispherical optical element of the missile seeker. [0003] In the prior art, methods for making micro-metal grids on a hemispherical surface include: [0004] 1. On the photoresist on the surface of the hemisphere, a micro-grid pattern is formed on the photoresist by laser direct writing lithography, and then a metal layer (copper, etc.) is...

AI Technical Summary

Problems solved by technology

Considering factors such as the coaxiality of the workpiece table rotation, the control accuracy of the rotation angle, the metal etching error, and the lift-off process, it is difficult for the line width of this micro-metal grid to be less than 10 microns. In addition, the thickness of the metal layer in the evaporation process It is difficult to be higher than 1um, and its electromagnetic shielding effect is affected

In terms of processing efficiency, considering the mechanical scanning of laser direct writing, the micro-grid pattern is square, so that the direction of the grid lines is the same as the scanning direction. Since it is written line by line, when the workpiece size is large and there are many grid lines, its Processing efficiency is very low

[0007] Therefore, the above-mentioned method for preparing hemispherical metal grids has low precision and high cost, and it is difficult to prepare them consistently in large quantities.

Another disadvantage is that multiple processing on the surface of the optical element will affect the surface quality of the optical workpiece. At the same time, the preparation of the metal grid cover for other irregular shaped workpieces is more difficult.

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