A processing method of ferroelectric single crystal material without dielectric dispersion in microwave frequency band
A ferroelectric single crystal, microwave frequency band technology, applied in the direction of polycrystalline material growth, single crystal growth, single crystal growth, etc., can solve the problems of unfavorable ferroelectrics, achieve good frequency stability, huge application value, and stable performance Effect
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Embodiment 1
[0031] A method for processing a ferroelectric single crystal material without dielectric dispersion in the microwave frequency band, comprising a two-step processing process of high temperature annealing and variable temperature stepwise polarization, specifically comprising the following steps:
[0032] 1) High-temperature annealing: the ferroelectric single crystal material (PIN-PMN-PT) grown by the improved Bridgman technique was polished and machined with 1000# sandpaper to form a cylindrical sample with a diameter of 2 mm and a length of 5 mm. A pair of parallel electrodes were first prepared by vacuum sputtering on both ends of the cylinder (test surface). The parallel electrodes include a metal Cr electrode with a thickness of 50nm in contact with the ferroelectric single crystal material, and then sputtering on the metal Cr electrode to prepare a layer of metal Pt electrode with a thickness of 200nm. Heat to 500°C (or 200°C above the Curie temperature) in an air sinte...
Embodiment 2
[0037]A method for processing a ferroelectric single crystal material without dielectric dispersion in the microwave frequency band, comprising a two-step processing process of high temperature annealing and variable temperature stepwise polarization, specifically comprising the following steps:
[0038] 1) High temperature annealing: The ferroelectric single crystal material (PIN-PMN-PT) grown by the improved Bridgman technique is polished and machined with 1000# sandpaper to form a cylindrical sample with a diameter of 1.5mm and a length of 4mm , a pair of parallel electrodes were first prepared by vacuum sputtering on both ends of the cylinder (test surface). The parallel electrodes include a metal Cr electrode with a thickness of 70nm in contact with the ferroelectric single crystal material, and then sputtering on the metal Cr electrode to prepare a layer of metal Pt electrode with a thickness of 245nm. Heat to 500°C (or 200°C above the Curie temperature) in an air sinter...
Embodiment 3
[0041] A method for processing a ferroelectric single crystal material without dielectric dispersion in the microwave frequency band, comprising a two-step processing process of high temperature annealing and variable temperature stepwise polarization, specifically comprising the following steps:
[0042] 1) High-temperature annealing: the ferroelectric single crystal material (PIN-PMN-PT) grown by the improved Bridgman technique was polished and machined with 1000# sandpaper to form a cylindrical sample with a diameter of 1 mm and a length of 8 mm. A pair of parallel electrodes were first prepared by vacuum sputtering on both ends of the cylinder (test surface). The parallel electrodes include a metal Cr electrode with a thickness of 100nm in contact with the ferroelectric single crystal material, and then sputtering on the metal Cr electrode to prepare a layer of metal Pt electrode with a thickness of 300nm. Heat to 500°C (or 200°C above the Curie temperature) in an air sint...
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