Plasma source system and plasma generation method

Abstract

The invention discloses a plasma source system and a plasma generating method. The system comprises pipeline transmission equipment for transporting to-be-reacted gas, an annular magnetic field generator and direct-current biasing equipment with adjustable potentials, magnetic penetration and electric conduction as well as plasma reaction equipment with a cylindrical cavity; the middle axes of the magnetic field generator and the plasma reaction equipment coincide with each other; a strong electric field is formed in the cylindrical cavity; an opening is formed at one end of the plasma reaction equipment away from the direct-current biasing equipment; and the magnetic field generator and the plasma reaction equipment form a divergent magnetic field at the opening. A quasi-neutral high-energy plasma beam is generated in the use of the energy supplying of electromagnetic waves and the rational design of the magnetic field; a divergent magnetic field structure is obtained at the opening of the plasma reaction equipment; plasmas and electrons can be ejected simultaneously; as the high-energy ion beams are obtained, the quasi-neutrality of the beam is guaranteed, so that the structure of a cathode electron source is omitted; the cost is reduced, the structure is simplified and the pollution of the cathode is avoided.

Description

technical field [0001] The invention relates to plasma source technology, in particular to a direct plasma source system and a plasma generation method. Background technique [0002] Plasma sources can generate reactive particles or radicals, which can be used for ion-assisted sputter deposition and diamond-like deposition. Two more important elements of the generated high-energy ion beam are: ion energy and ion beam size. According to different process requirements, the required ion energy and ion beam current are different. Traditional plasma sources adjust the ion energy and ion beam current by adjusting the voltage and current of the discharge anode, and often change the values ​​of both at the same time, which brings great troubles to process exploration. [0003] In addition, the traditional ion source also needs to add a cathode electron source to neutralize the ion beam, so as to ensure the uniformity of the beam current, so that the non-conductive material to be d...

AI Technical Summary

Problems solved by technology

The hot cathode filament or hollow cathode electron source is used to provide the initial electrons required for plasma ionization and the negative electron beam required to neutralize the positive ion beam. The hollow cathode electron source generates the electron beam by heating the hot cathode material to scatter electrons outward. These hot cathode materials are very fragile, and they are very vulnerable to failure due to erosion and pollution by the ion beam, so the life is difficult to improve; and it increases the complexity of the system and reduces the reliability of the system.

Due to different process requirements, the ion beam current size will be changed at the same time when adjusting the ion energy, which makes the adjustment process very complicated and cumbersome

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