A method for preparing a mask with high aperture ratio and the mask

A mask plate and aperture ratio technology, which is applied in the preparation of mask plates and the field of mask plates, can solve the problems of inability to achieve high-resolution screen evaporation and low aperture ratio, and achieve increased aperture ratio and increased aperture ratio. Aperture ratio, the effect of ensuring the deposition accuracy

Active Publication Date: 2017-12-29
KUNSHAN NEW FLAT PANEL DISPLAY TECH CENT +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] For this reason, the technical problem to be solved by the present invention is that the Invar (Invar alloy) mask plate opening ratio in the prior art is low and the position of the opening has a large deviation, so that the evaporation of the high-resolution screen cannot be realized, and then A method for preparing a mask with a high aperture ratio is provided, and the mask prepared by the method has a relatively high aperture ratio

Method used

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  • A method for preparing a mask with high aperture ratio and the mask
  • A method for preparing a mask with high aperture ratio and the mask
  • A method for preparing a mask with high aperture ratio and the mask

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Embodiment 1

[0031] Such as figure 2 and image 3 As shown, the preparation method of a high aperture ratio mask plate related to the present invention comprises the following steps:

[0032] S1: Coating light-curing material on the surface of the mask plate, and curing the light-curing material in the main area 02 of the mask plate and the connection bridge reserved area 05 to form a low polymer, and cleaning with alcohol to remove the area to be corroded by the connection bridge 04 Light-curing materials whose surface has not been cured;

[0033] S2: Immerse the mask plate coated with low polymer prepared in step S1 into FeCl with a concentration of 80-95% 3 Solution, soaked for 30-300 seconds under the condition of energized voltage of 70-100v to remove the connecting bridge to be corroded area 04, and obtain a mask plate coated with a low polymer; the low polymer is polyimide .

[0034] S3: The mask plate coated with low polymer is placed in a solution of dimethylacetamide and soa...

Embodiment 2

[0039] Another embodiment of the present invention is as Figure 4 As shown, a method for preparing a mask plate with a high aperture ratio of the present invention comprises the following steps:

[0040] S1: Coating light-curing material on the surface of the mask plate, and curing the light-curing material in the main area 02 of the mask plate and the connection bridge reserved area 05 to form a low polymer, and cleaning with alcohol to remove the area to be corroded by the connection bridge 04 Light-curing materials whose surface has not been cured;

[0041] S3. Immerse the mask plate coated with low polymer prepared in step S1 into FeCl with a concentration of 80-95% 3 Solution, soaked for 30-300 seconds under the condition of energized voltage of 70-100v to remove the connecting bridge to be corroded area 04, and obtain a mask plate coated with a low polymer; the low polymer is polyimide .

[0042] S4: The mask plate coated with the low polymer is placed in a solution ...

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Abstract

The invention provides a method for preparing a mask with a high aperture ratio, comprising the following steps: S1, coating a photocurable material on the surface of the mask, and performing ultraviolet light on the photocurable material in the main body area of ​​the mask and the connecting bridge reserved area. Light irradiation and curing to form a low polymer, cleaning and removing the uncured light-cured material on the surface of the connecting bridge to be corroded, and then immersing the mask plate coated with a low polymer in a corrosive solution to remove the connecting bridge to be corroded Zone, to obtain a mask plate coated with low polymer on the surface; S2: remove the low polymer on the surface of the mask plate to obtain a mask plate with a high aperture ratio. The present invention can effectively increase the aperture ratio of the mask plate by reducing the width of the connecting bridge of the main body of the mask plate, specifically, the aperture ratio can be increased by 30-50%.

Description

technical field [0001] The invention relates to the technical field of manufacturing an organic electroluminescent device, in particular to a method for preparing a mask with a high aperture ratio and a mask prepared by the method. Background technique [0002] As a new generation of display devices, organic light-emitting displays (OLEDs) have incomparable advantages over traditional displays, such as self-illumination, no need for backlight, ultra-thin and flexible displays, low driving voltage, power saving, fast response, etc. etc., are widely used. [0003] The RGB juxtaposition method is a basic method for OLED devices to realize full-color display. In this method, R / G / B monochrome devices are used as sub-pixels and combined into one pixel to realize full-color display. The method makes full use of the high-efficiency characteristics of the OLED device, and the manufactured screen body has high efficiency and low power consumption. When evaporating R / G / B sub-pixels,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L51/56
CPCH10K71/00
Inventor 张秀玉刘周英党鹏乐张小宝
Owner KUNSHAN NEW FLAT PANEL DISPLAY TECH CENT
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