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Nanometer wax-removal degreasing cleaning agent and preparation method thereof

A cleaning agent and nanotechnology, applied in the field of cleaning agents, can solve the problems of corrosion of stainless steel tank body of ultrasonic equipment, difficult biodegradation of surfactants, unsatisfactory cleaning effect, etc., to achieve good economic and social benefits, wax removal Strong ability and the effect of enhancing cleaning ability

Inactive Publication Date: 2015-04-29
XIAMEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] 1. The wax and oil removal speed is slow, the service life is short, the cleaning temperature is high, sometimes the dirt is not completely removed, and the cleaning effect is not very ideal
[0004] 2. Corrosion of the stainless steel tank of the ultrasonic equipment
[0005] 3. After the product is cleaned, sometimes it will be over-corroded, and the surface will be black and dark, which will affect the quality of the product
[0006] 4. The surfactant used in the cleaning agent is not easy to biodegrade, causing great environmental pollution

Method used

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  • Nanometer wax-removal degreasing cleaning agent and preparation method thereof
  • Nanometer wax-removal degreasing cleaning agent and preparation method thereof
  • Nanometer wax-removal degreasing cleaning agent and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] A nano wax and degreasing cleaning agent, its composition and quality are respectively: coconut oil diethanolamide (6501) 4kg, coconut oil alkanolamide phosphate (6503) 26kg; Linear alkylbenzene sulfonic acid 6kg; 5kg of chypre oleic acid; 10kg of fatty alcohol polyoxyethylene ether (JFC); 8kg of triethanolamine; 3kg of YT-61 special surfactant for wax removal; 0.5kg of tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium); MPA-500 Nano silica airgel powder 0.05kg, deionized water 37.45kg.

[0033] The preparation method of described nanometer dewaxing degreasing cleaning agent, its steps are:

[0034] (1) take each component by mass parts;

[0035] (2) Add the metal chelating agent tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium) into an appropriate amount of deionized water, then stir to make it completely dissolve, and obtain an aqueous solution of tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium) for later use.

[0036] (3) Add ...

Embodiment 2

[0038] A nano wax and oil removal cleaning agent, its composition and quality are respectively: coconut oil diethanolamide (6501) 4kg, coconut oil alkanolamide phosphate (6503) 20kg; linear alkylbenzene sulfonic acid 7kg; 4kg of chypre oleic acid; 8kg of fatty alcohol polyoxyethylene ether (JFC); 6kg of triethanolamine; 4kg of YT-61 special surfactant for wax removal; 0.5kg of tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium); MPA-500 Nano silica airgel powder 0.07kg, deionized water 46.43kg.

[0039] The preparation method of described nanometer dewaxing degreasing cleaning agent, its steps are:

[0040] (1) take each component by mass parts;

[0041] (2) Add the metal chelating agent tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium) into an appropriate amount of deionized water, then stir to make it completely dissolve, and obtain an aqueous solution of tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium) for later use.

[0042] (3) Add ...

Embodiment 3

[0044] A nano wax and oil removal cleaning agent, its composition and quality are respectively: coconut oil diethanolamide (6501) 3kg, coconut oil alkanolamide phosphate (6503) 22kg; linear alkylbenzene sulfonic acid 9kg; 6kg of chypre oleic acid; 7kg of fatty alcohol polyoxyethylene ether (JFC); 8kg of triethanolamine; 2.5kg of YT-61 special surfactant for wax removal; 0.1kg of 500nm silica airgel powder, 41.4kg of deionized water.

[0045] The preparation method of described nanometer dewaxing degreasing cleaning agent, its steps are:

[0046] (1) take each component by mass parts;

[0047] (2) Add the metal chelating agent tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium) into an appropriate amount of deionized water, then stir to make it completely dissolve, and obtain an aqueous solution of tetrasodium ethylenediaminetetraacetic acid (ETDA tetrasodium) for later use.

[0048] (3) Add emulsifier chypre oleic acid, corrosion inhibitor triethanolamine and builde...

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Abstract

The invention relates to a nanometer wax-removal degreasing cleaning agent and a preparation method thereof and relates to cleaning agents. The nanometer wax-removal degreasing cleaning agent is prepared from the following raw materials in mass ratio: 20-30 of detergent, 5-10 of a builder, 3-6 of an emulsifier, 6-12 of a penetrating agent, 5-10 of a metal corrosion inhibitor, 3-6 of a wax-removal surfactant, 0.5-1.0 of a metal chelating agent, 0.05-0.1 of nanometer silicon oxide and 24-58 of deionized water. The preparation method comprises the following steps of (1) adding the metal chelating agent in deionized water to obtain an aqueous solution of the metal chelating agent; and 2) adding the emulsifier, the metal corrosion inhibitor and the nanometer silicon oxide into a reactor, adding deionized water and the detergent, adding the penetrating agent, the wax-removal surfactant and nanometer silicon oxide, stirring and adding the aqueous solution of the metal chelating agent obtained in the step (1), supplementing the residual deionized water and further stirring to obtain the nanometer wax-removal degreasing cleaning agent. The cleaning agent has the advantages of high wax-removal and degreasing speeds, long application period, good cleaning effect and environmental friendliness.

Description

technical field [0001] The invention relates to a cleaning agent, in particular to a nanometer cleaning agent for wax and oil removal and a preparation method thereof. Background technique [0002] In recent years, with the continuous improvement of people's living standards and industrial manufacturing technology in our country, a variety of hardware products, plastic products, printed electronic products, high-precision application products and many other products have been widely used in industrial production and people's daily life. The market demand is huge. Various metal products and plastic products use a lot of processing aids such as lubricating grease and polishing wax in the process of manufacturing (such as cutting, polishing, grinding), so a lot of adhesion will be produced after processing, especially after mechanical polishing Strong wax, oil, dust and other mixed dirt residues adhere to the surface of the product. If they are not cleaned thoroughly, they wil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/831C11D3/60C11D3/33C11D3/30
Inventor 余煜玺
Owner XIAMEN UNIV
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