Precise positioning table capable of switching stations

Abstract

The invention provides a precise positioning table capable of switching stations. The precise positioning table comprises a station switching device, wherein the station switching device comprises a bearing table, a movable clamping and positioning device and a fixed auxiliary clamping and positioning device and is used for precisely positioning a borne object during station switching. According to the precise positioning table capable of switching the stations, the borne object is driven by virtue of the movable clamping and positioning device and the fixed auxiliary clamping and positioning device and is then moved. Compared with a manner that the movement of the borne object is driven by the movement of the bearing table in the prior art, the structure is relatively simple, and the space in the vertical direction is reduced; meanwhile, the positioning and guiding functions are simultaneously realized, and the movement of the borne object is carried out among the required stations. A mask table which has few vertical levels and a relatively simple structure and does not require much vertical space is provided.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a mask or a workpiece table and a station switching mechanism thereof. Background technique [0002] The photolithography apparatus in the prior art is mainly used in the field of integrated circuit IC or flat panel display and the manufacture of other micro devices. With a photolithographic apparatus, multilayer masks with different mask patterns are sequentially imaged in precise alignment on a photoresist-coated wafer, such as a semiconductor wafer or an LCD panel. Lithography devices are generally divided into two categories, one is a stepping lithography device, the mask pattern is exposed and imaged on one exposure area of ​​the wafer, and then the wafer moves relative to the mask to move the next exposure area to the mask pattern and under the projection objective, the mask pattern is again exposed on another exposed area of ​​the wafer, and the process is repea...

AI Technical Summary

Problems solved by technology

[0005] First, the switching mechanism in the prior art uses a linear guide rail for guidance, and the error of the guide rail itself and the vertical adjustment error directly affect the Z-direction height change of the loaded object when the graphics are switched, resulting in the Z-direction height change of the loaded object before and after the graphics switch Big

[0006] Second, there may be vertical coupling between the two linear guide rails and the carrying platform in the prior art, which makes it difficult to assemble the two guide rails

[0007] Third, the existing technical mask table has many vertical layers, complex structure, and requires a large vertical space

[0008] In addition, in the existing technology, in order to make the Z-direction height change of the bearing object before and after the graphics switch meet the precision requirements, the installation and adjustment of the mask table often puts forward higher requirements, which increases the difficulty of installation and adjustment.

Images