Equipment for performing surface treatment on graphene workpieces as well as treatment method of equipment

A surface treatment and graphene technology, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc., can solve the problems of large environmental pollution, high production costs, and great harm to human body, and achieve simple equipment operation, improved production efficiency, The effect of short cleaning time

Inactive Publication Date: 2015-04-29
2D CARBON CHANGZHOU TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The deficiencies of the ultrasonic cleaning method are: (1) organic solvents such as chloroform, acetone, and isopropanol are used in cleaning, which brings pollution to the production environment and solvent post-treatment, and the solvent usage is large and harmful to the human body; (2) ) The environmental pollution is large, the efficiency is low, the production cost is high, and it i

Method used

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  • Equipment for performing surface treatment on graphene workpieces as well as treatment method of equipment
  • Equipment for performing surface treatment on graphene workpieces as well as treatment method of equipment

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0030] (Example 1)

[0031] See figure 1 , the equipment for surface treatment of graphene parts in this embodiment includes a vacuum chamber 1, a vacuum pump 2, an air pumping pipeline 3, a nitrogen filling 2 Device 4, Ar charging device 5, O charging 2 A device 6 , an inflation pipe 7 , an electronic control device 8 and at least one pair of electrodes 9 .

[0032] The vacuum chamber 1 is provided with a balance valve 11 . The vacuum pump 2 is communicated with the vacuum chamber 1 through an exhaust pipe 3 . Charge N 2 Device 4, Ar charging device 5 and O charging 2 The device 6 communicates with the vacuum chamber 1 through the gas-filled duct 4 . The electrode 6 is arranged in the vacuum chamber 1 and is connected with the electric control device 8 .

[0033] The processing method of the equipment for surface-treating graphene parts of the present embodiment comprises the following steps:

[0034] 1. Put the graphene parts in, close the vacuum chamber 1, then turn...

Example Embodiment

[0046] (Example 2)

[0047] See figure 2 , This embodiment is basically the same as Embodiment 1, the difference is that it also includes a plurality of separators 10 arranged in the vacuum chamber 1 , and each separator 10 is provided with a pair of electrodes 6 .

[0048] The equipment for surface treatment of graphene parts in this embodiment has higher production efficiency and is more suitable for large-scale and mass production requirements.

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Abstract

The invention discloses equipment for performing surface treatment on graphene workpieces as well as a treatment method of the equipment. The equipment comprises a vacuum chamber, a vacuum pump, a pumping pipeline, an air charging device, an air charging pipeline, an electrical control device and at least one pair of electrodes, wherein a balance valve is arranged on the vacuum chamber; the vacuum pump is communicated with the vacuum chamber through the pumping pipeline; the air charging device is communicated with the vacuum chamber through the air charging pipeline; the electrodes are arranged in the vacuum chamber and connected with the electrical control device. The equipment is simple to operate, short time is consumed for cleaning, the production efficiency is high, the graphene workpieces can be cleaned in a large-scale manner, foreign matters are not left on the outer surfaces of the cleaned graphene workpieces, and previous preparation is provided for follow-up oxidation corrosion or electrochemical stripping of a metal substrate.

Description

technical field [0001] The invention relates to a device for surface treatment of graphene parts and a treatment method thereof. Background technique [0002] Chemical vapor deposition (Chemical Vapor Deposition, CVD) can grow large-area single-layer or multi-layer graphene films on metal substrates. The resulting graphene has good quality and is easy to transfer. It is currently a common method for preparing graphene films. It is widely used in the preparation of graphene transistors and transparent conductive films. [0003] There will be organic matter and residual graphene on the outer surface of the graphene parts prepared by CVD method. The residual graphene is grown on both sides of the metal substrate by CVD method. The organic matter is transferred to the target substrate PET substrate. from the material binder. Therefore, before oxidizing and corroding the metal substrate or electrochemically stripping the metal substrate, it is necessary to clean the transferred...

Claims

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Application Information

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IPC IPC(8): H01L21/67H01L21/02
CPCH01L21/67011H01L21/02057
Inventor 金虎顾永强狄建青武文鑫孙洪波徐振飞龚健
Owner 2D CARBON CHANGZHOU TECH INC
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