Equipment for performing surface treatment on graphene workpieces as well as treatment method of equipment

Abstract

The invention discloses equipment for performing surface treatment on graphene workpieces as well as a treatment method of the equipment. The equipment comprises a vacuum chamber, a vacuum pump, a pumping pipeline, an air charging device, an air charging pipeline, an electrical control device and at least one pair of electrodes, wherein a balance valve is arranged on the vacuum chamber; the vacuum pump is communicated with the vacuum chamber through the pumping pipeline; the air charging device is communicated with the vacuum chamber through the air charging pipeline; the electrodes are arranged in the vacuum chamber and connected with the electrical control device. The equipment is simple to operate, short time is consumed for cleaning, the production efficiency is high, the graphene workpieces can be cleaned in a large-scale manner, foreign matters are not left on the outer surfaces of the cleaned graphene workpieces, and previous preparation is provided for follow-up oxidation corrosion or electrochemical stripping of a metal substrate.

Description

technical field [0001] The invention relates to a device for surface treatment of graphene parts and a treatment method thereof. Background technique [0002] Chemical vapor deposition (Chemical Vapor Deposition, CVD) can grow large-area single-layer or multi-layer graphene films on metal substrates. The resulting graphene has good quality and is easy to transfer. It is currently a common method for preparing graphene films. It is widely used in the preparation of graphene transistors and transparent conductive films. [0003] There will be organic matter and residual graphene on the outer surface of the graphene parts prepared by CVD method. The residual graphene is grown on both sides of the metal substrate by CVD method. The organic matter is transferred to the target substrate PET substrate. from the material binder. Therefore, before oxidizing and corroding the metal substrate or electrochemically stripping the metal substrate, it is necessary to clean the transferred...

AI Technical Summary

Problems solved by technology

The deficiencies of the ultrasonic cleaning method are: (1) organic solvents such as chloroform, acetone, and isopropanol are used in cleaning, which brings pollution to the production environment and solvent post-treatment, and the solvent usage is large and harmful to the human body; (2) ) The environmental pollution is large, the efficiency is low, the production cost is high, and it is necessary to wipe the part twice or remove the residual solvent on the part, which will affect the destruction of the graphene structure, thereby reducing the performance of the graphene part

The shortcomings of the centrifugal cleaning method are: (1) it is impossible to clean graphene parts in large quantities; (2) the cleaned graphene parts are not clean and easy to leave organic matter

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