Pulse laser etching device used for transparent electroconductive thin film and control method of pulse laser etching device

Abstract

The invention discloses a pulse laser etching device used for a transparent electroconductive thin film and a control method of the pulse laser etching device. The pulse laer etching device comprises a vacuum platform used for adsorbing a film material, a laser and a galvanometer, a beam expander is arranged between the laser and the galvanometer, a CCD image sensor is arranged above the vacuum platform, an air blowing device is arranged on one side of the vacuum platform, and a dust collecting device is arranged on the other side of the vacuum platform. The high-frequency short-pulse laser is adopted as a laser source for laser etching, film material etching is completed through the small-breadth galvanometer, and generated dust is collected through an air blowing system and a dust collecting system, so that the defects of high cost, low efficiency, large processing limitation, serious pollution and the like in the prior art can be overcome, etching process can be simplified, and accuracy can be improved.

Description

technical field [0001] The invention relates to an etching device for a conductive thin film and a control method thereof, in particular to a pulse laser etching device for a transparent conductive thin film and a control method thereof. Background technique [0002] Conventional methods for manufacturing lines on the conductive film layer on the touch screen mainly include chemical wet etching and yellow photolithography. Among them, in the process method of chemical wet etching conductive film layer, the time from process design to completion of etching is long, and the cost of fixtures, consumables and labor costs that need to be invested is relatively high; in addition, the waste water and waste acid generated in the production process etc. The pollution to the environment is also relatively serious, and the whole process flow has also caused a waste of energy. The yellow photolithography process requires a large initial investment, high cost, and a relatively narrow se...

AI Technical Summary

Problems solved by technology

Among them, in the process method of chemical wet etching conductive film layer, the time from process design to completion of etching is long, and the cost of fixtures, consumables and labor costs that need to be invested is relatively high; in addition, the waste water and waste acid generated in the production process etc. The pollution to the environment is also relatively serious, and the entire technological process has also caused a waste of energy.

The yellow photolithography process requires a large initial investment, high cost, and a relatively narrow selection of materials. It is not suitable for all conductive film production methods on the market. In addition, the daily maintenance, consumables, and labor costs are also relatively high. , resulting in a sharp increase in the production cost of the entire finished product, and the application field is greatly restricted

[0003] In addition, the thinnest line width of the conductive film layer on the traditional etched touch screen can only reach 80um, and the yield rate is low, the linearity is uneven, and it is cumbersome to replace different batches of products, which requires chemical cleaning and pollutes the environment; The net tension value is small, the finished material has poor wear resistance and chemical resistance, and is easy to age and become brittle

This printing method has complex procedures, requires more consumables in production, and requires more manpower to maintain the production line, which has great limitations.

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