Pulse laser etching device used for transparent electroconductive thin film and control method of pulse laser etching device
A technology of transparent conductive film and pulsed laser, which is applied to laser welding equipment, conductors, circuits, etc., can solve the problems of increased production cost of finished products, environmental pollution, complex process, etc., and achieves reduced labor costs, high efficiency, and simple equipment operation Effect
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 The present invention will be further described below with reference to the drawings and embodiments.
 figure 1 It is a schematic diagram of the structure of a pulsed laser etching device for transparent conductive films of the present invention.
 See figure 1 , The pulsed laser etching device for transparent conductive film provided by the present invention includes a vacuum platform 1, a laser 2 and a galvanometer 4 for adsorbing film materials, and a beam expander 3 is provided between the laser 2 and the galvanometer 4 A CCD image sensor 5 (Charge-coupled Device, full Chinese name: charge coupled device) is provided above the vacuum platform 1, and a blowing device 6 is provided on one side of the vacuum platform 1, and a dust collector is provided on the other side. Device 7.
 In the pulsed laser etching device for transparent conductive film provided by the present invention, the CCD image sensor 5 is preferably located directly above the film ...
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