Pulse laser etching device used for transparent electroconductive thin film and control method of pulse laser etching device

A technology of transparent conductive film and pulsed laser, which is applied to laser welding equipment, conductors, circuits, etc., can solve the problems of increased production cost of finished products, environmental pollution, complex process, etc., and achieves reduced labor costs, high efficiency, and simple equipment operation Effect

Inactive Publication Date: 2014-02-19
苏州镭明激光科技有限公司
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Problems solved by technology

Among them, in the process method of chemical wet etching conductive film layer, the time from process design to completion of etching is long, and the cost of fixtures, consumables and labor costs that need to be invested is relatively high; in addition, the waste water and waste acid generated in the production process etc. The pollution to the environment is also relatively serious, and the entire technological process has also caused a waste of energy.
The yellow photolithography process requires a large initial investment, high cost, and a relatively narrow selection of materials. It is not suitable for all conductive film production methods on the market. In addition, the daily maintenance, consumables, and labor costs are also relatively high.

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  • Pulse laser etching device used for transparent electroconductive thin film and control method of pulse laser etching device

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[0018] The present invention will be further described below with reference to the drawings and embodiments.

[0019] figure 1 It is a schematic diagram of the structure of a pulsed laser etching device for transparent conductive films of the present invention.

[0020] See figure 1 , The pulsed laser etching device for transparent conductive film provided by the present invention includes a vacuum platform 1, a laser 2 and a galvanometer 4 for adsorbing film materials, and a beam expander 3 is provided between the laser 2 and the galvanometer 4 A CCD image sensor 5 (Charge-coupled Device, full Chinese name: charge coupled device) is provided above the vacuum platform 1, and a blowing device 6 is provided on one side of the vacuum platform 1, and a dust collector is provided on the other side. Device 7.

[0021] In the pulsed laser etching device for transparent conductive film provided by the present invention, the CCD image sensor 5 is preferably located directly above the film ...

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Abstract

The invention discloses a pulse laser etching device used for a transparent electroconductive thin film and a control method of the pulse laser etching device. The pulse laer etching device comprises a vacuum platform used for adsorbing a film material, a laser and a galvanometer, a beam expander is arranged between the laser and the galvanometer, a CCD image sensor is arranged above the vacuum platform, an air blowing device is arranged on one side of the vacuum platform, and a dust collecting device is arranged on the other side of the vacuum platform. The high-frequency short-pulse laser is adopted as a laser source for laser etching, film material etching is completed through the small-breadth galvanometer, and generated dust is collected through an air blowing system and a dust collecting system, so that the defects of high cost, low efficiency, large processing limitation, serious pollution and the like in the prior art can be overcome, etching process can be simplified, and accuracy can be improved.

Description

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Claims

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Application Information

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Owner 苏州镭明激光科技有限公司
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