Pulse laser etching device used for transparent electroconductive thin film and control method of pulse laser etching device

A technology of transparent conductive film and pulsed laser, which is applied to laser welding equipment, conductors, circuits, etc., can solve the problems of increased production cost of finished products, environmental pollution, complex process, etc., and achieves reduced labor costs, high efficiency, and simple equipment operation Effect

CN103586586AInactive Publication Date: 2014-02-19苏州镭明激光科技有限公司
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
Publication Date
2014-02-19
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a pulse laser etching device used for a transparent electroconductive thin film and a control method of the pulse laser etching device. The pulse laer etching device comprises a vacuum platform used for adsorbing a film material, a laser and a galvanometer, a beam expander is arranged between the laser and the galvanometer, a CCD image sensor is arranged above the vacuum platform, an air blowing device is arranged on one side of the vacuum platform, and a dust collecting device is arranged on the other side of the vacuum platform. The high-frequency short-pulse laser is adopted as a laser source for laser etching, film material etching is completed through the small-breadth galvanometer, and generated dust is collected through an air blowing system and a dust collecting system, so that the defects of high cost, low efficiency, large processing limitation, serious pollution and the like in the prior art can be overcome, etching process can be simplified, and accuracy can be improved.
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Description

technical field

[0001] The invention relates to an etching device for a conductive thin film and a control method thereof, in particular to a pulse laser etching device for a transparent conductive thin film and a control method thereof. Background technique

[0002] Conventional methods for manufacturing lines on the conductive film layer on the touch screen mainly include chemical wet etching and yellow photolithography. Among them, in the process method of chemical wet etching conductive film layer, the time from process design to completion of etching is long, and the cost of fixtures, consumables and labor costs that need to be invested is relatively high; in addition, the waste water and waste acid generated in the production process etc. The pollution to the environment is also relatively serious, and the whole process flow has also caused a waste of energy. The yellow photolithography process requires a large initial investment, high cost, and a relatively narrow se...

Examples

Embodiment Construction

[0018] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0019] figure 1 It is a schematic structural diagram of a pulsed laser etching device for transparent conductive thin films according to the present invention.

[0020] See figure 1 The pulse laser etching device for transparent conductive thin films provided by the present invention includes a vacuum platform 1 for absorbing film materials, a laser 2 and a vibrating mirror 4, and a beam expander 3 is arranged between the laser 2 and the vibrating mirror 4 , the top of the vacuum platform 1 is provided with a CCD image sensor 5 (Charge-coupled Device, Chinese full name: charge coupled device), one side of the vacuum platform 1 is provided with an air blowing device 6, and the other side is provided with a dust collector. device7.

[0021] In the pulse laser etching device used for transparent conductive thin films provided by the present invention, t...