High depth-to-width ratio super-resolution nano photoetching structure and method

Abstract

The invention relates to a nano photoetching structure and method, and particularly relates to a high depth-to-width ratio super-resolution nano photoetching structure. The high depth-to-width ratio super-resolution nano photoetching structure comprises a transparent upper substrate layer, a metal grating layer, a photoresist layer, a gain medium layer, a metal film layer and a lower substrate layer, wherein the metal grating layer, the photoresist layer, the gain medium layer and the metal film layer collectively form a four-layer metal waveguide resonance cavity structure based on surface plasmas. According to the high depth-to-width ratio super-resolution nano photoetching structure, the metal waveguide structure consists of four layers of metal waveguides such as the metal grating layer, the photoresist layer, the gain medium layer and the metal film layer, and the depth-to-width ratio of generated nano patterns breaks through an existing surface plasma photoetching technology. Compared with a traditional photoetching method based on the surface plasmas, the depth-to-width ratio of generated nano photoetched stripes is greatly increased, and the resolution and the depth-to-width ratio of the nano patterns can be adjusted by adjusting materials and the thickness of a gain medium.

Description

technical field [0001] The invention relates to a nano-lithography structure and method, in particular to a high aspect ratio super-resolution nano-lithography structure and method. Background technique [0002] With the continuous development of microelectronics and semiconductor industries, it is particularly important to obtain high-resolution, high-quality photolithography technology for nano-patterns. Since traditional optical imaging and microfabrication technologies are limited by the diffraction limit, using the superdiffraction properties of surface plasmon waves (SPWs) will provide a potential technical approach to obtain subwavelength and even smaller nanometer-sized structures. . A notable feature of SPWs is that its wavelength is much smaller than that of light waves at the same frequency, and at the same time it has the singular optical properties of near-field enhancement effect, which can effectively overcome the shortcomings of evanescent wave weak field an...

AI Technical Summary

Problems solved by technology

[0005] Although the above method can realize super-resolution nanolithographic patterns with high aspect ratio, for optical systems with high numerical aperture, the corresponding equipment is complex and expensive.

At the same time, it is more complicated to realize the oblique incidence of two symmetrical beams

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