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Preparation method for display substrate

A technology for display substrates and substrates, which is used in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., and can solve problems such as pollution, low performance of display substrate products, and graphene shedding.

Active Publication Date: 2015-05-20
BOE TECH GRP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] When the photoresist directly contacts the graphene layer, it will cause the graphene to fall off and pollute, which will lead to the deterioration of the electrical conductivity of the graphene, and finally lead to the lower product performance of the display substrate.

Method used

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  • Preparation method for display substrate

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Embodiment Construction

[0039] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0040] Please refer to figure 1 , the method for preparing a display substrate provided by an embodiment of the present invention includes:

[0041] Step S101, forming a graphene layer on the metal catalyst substrate;

[0042] Step S102, forming a mask pattern on the metal catalytic substrate through a patterning process;

[0043] Step S103, using the mask pattern formed by the metal catalyst substrate as a mask to etch the graphene layer to form a graphene ...

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Abstract

The invention relates to the field of a display technology and discloses a preparation method for a display substrate. The preparation method comprises the steps that a graphene layer is formed on a metal catalysis substrate; a mask pattern is formed on the metal catalysis substrate through a one-time composition process; the graphene layer is etched by taking the mask pattern formed on the metal catalysis substrate as a mask to form a graphene pattern; the residual metal catalysis substrate is removed. According to the preparation method for the display substrate, photo-resist is not in contact with graphene in the process of forming the graphene pattern, the metal catalysis substrate formed on the graphene is taken as the mask to carry out pattern composition on the graphene layer, so that the direct contact between the photo-resist and the graphene layer is prevented, the possibility that the graphene layer is contaminated during pattern composition is reduced, the electrical conductivity of the graphene layer after pattern composition is improved, and the product quality of the display substrate is further improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for preparing a display substrate. Background technique [0002] Graphene is a carbon atom with sp 2 The hybrid orbitals form a hexagonal planar film with a honeycomb lattice, a two-dimensional material with a thickness of only one carbon atom, and a thickness of only 0.335nm. It is currently the thinnest but also the hardest nanomaterial in the world. It is almost completely transparent, with a light absorption rate of only 2.3%, and a high thermal conductivity of 5300W / m·K. Graphene has good electronic conductivity, and its electron mobility is higher than 15000 cm at room temperature. 2 / V·s, while the resistivity is only 10 -6 Ω·cm is an excellent transparent conductive film with high light transmittance, high conductivity, high flexibility, high mechanical strength and high thermal conductivity. In the prior art, using graphene in a display substrate as a touch...

Claims

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Application Information

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IPC IPC(8): H01L21/77
Inventor 邸云萍
Owner BOE TECH GRP CO LTD
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