Preparation method of high-purity silicon dioxide
A silicon dioxide, high-purity technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of high impurities, unable to reach high-purity standards, etc., and achieve the effect of high purity and simple operation
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Embodiment 1
[0015] A preparation method of high-purity silicon dioxide, the specific preparation steps are as follows:
[0016] (1) Add 2000ml of pure water to a 3000ml beaker and heat to 80°C, add 1kg of analytically pure sodium silicate, stir and heat until dissolved, then filter, and the filtrate remains clear to obtain a sodium silicate solution for later use;
[0017] (2) Prepare high-purity nitric acid into a 50% nitric acid solution and slowly add it to the sodium silicate solution in step (1), while stirring continuously to form fine crystals, that is, silicon dioxide crystals;
[0018] (3) After the crystal precipitation is complete, stop adding nitric acid, let it stand for crystallization for 10 hours, add 2000ml of 80°C hot water to wash until the chloride in the crystal is qualified (chloride ≤ 1×10 -3 %), dry the crystals by centrifugation, put them on a tray and dry them at 100°C for 10 hours, then put them into a high-temperature furnace and burn them at 900°C-1000°C for 1...
Embodiment 2
[0030] A preparation method of high-purity silicon dioxide, the specific preparation steps are as follows:
[0031] (1) Add 1500ml of pure water to a 3000ml beaker and heat to 75°C, add 1kg of analytically pure sodium silicate, stir and heat until dissolved, then filter, the filtrate remains clear, and obtain a sodium silicate solution for later use;
[0032] (2) Prepare high-purity nitric acid into a 50% nitric acid solution and slowly add it to the sodium silicate solution in step (1), while stirring continuously to form fine crystals, that is, silicon dioxide crystals;
[0033] (3) Stop adding nitric acid after the crystal precipitation is complete, let it stand for 15 hours to crystallize, add 1500ml of hot water at 75°C to wash until the chloride in the crystal is qualified, spin the crystal to dry, put it on a plate and dry it at 100°C for 12 hours, and then enter the high temperature The furnace was burned at 900°C for 8 hours to obtain high-purity silica. After cooling...
Embodiment 3
[0036] A preparation method of high-purity silicon dioxide, the specific preparation steps are as follows:
[0037] (1) Add 3000ml of pure water to a 5000ml beaker and heat to 90°C, add 1kg of analytically pure sodium silicate, stir and heat until dissolved, then filter, the filtrate remains clear, and obtain a sodium silicate solution for later use;
[0038] (2) Prepare high-purity nitric acid into a 50% nitric acid solution and slowly add it to the sodium silicate solution in step (1), while stirring continuously to form fine crystals, that is, silicon dioxide crystals;
[0039] (3) Stop adding nitric acid after the crystal precipitation is complete, let it stand for 8 hours to crystallize, add 3000ml of 90°C hot water to wash until the chloride in the crystal is qualified, spin the crystal to dry, put it on a plate and dry it at 100°C for 8 hours, and then enter the high temperature The furnace was fired at 1000°C for 12 hours to obtain high-purity silica. After cooling, it...
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