Organic electroluminescence device and preparing method thereof
An electroluminescent device and luminescence technology, which is applied in the direction of electric solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of reduced luminous efficiency and low probability of exciton recombination
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[0048] Such as figure 2 The preparation method of the above-mentioned organic electroluminescence device shown, comprises the following steps:
[0049] S10 , performing surface pretreatment on the substrate 10 .
[0050] The substrate 10 is glass. Generally speaking, ordinary glass will do. In special application fields, special glass made by special process can also be selected.
[0051] The surface pretreatment process specifically includes: after the substrate 10 is rinsed with distilled water and ethanol in sequence, it is soaked in isopropanol overnight.
[0052] S20 , preparing the anode 20 on the substrate 10 by magnetron sputtering.
[0053] The anode 20 may be an indium tin oxide film (ITO), an aluminum-doped zinc oxide film (AZO) or an indium-doped zinc oxide film (IZO), and the thickness of the anode 20 is 50 nm to 300 nm. In a preferred embodiment, the anode 20 is an indium tin oxide film (ITO), and the thickness of the anode 20 is 120 nm.
[0054] The accel...
Embodiment 1
[0076] An organic electroluminescent device, including a substrate, an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer and a cathode stacked in sequence, the specific structure is expressed as: glass / ITO / MoO 3 / NPB / BCzVBi / TPBI / WO 3 : Ag / C70: MoO 3 / Mg / Ag. The preparation steps are:
[0077] Provide a commercially available common glass, rinse the glass with distilled water and ethanol in sequence, and soak it in isopropanol overnight.
[0078] The anode was prepared by magnetron sputtering on the surface-treated glass surface. The material of the anode is ITO, and the thickness is 120nm. The acceleration voltage of magnetron sputtering is 700V, the magnetic field is 120G, and the power density is 25W / cm 2 .
[0079] The working pressure is 8×10 -4 Under the condition of Pa, the evaporation rate of organic materials is 0.2nm / s, and the evaporation rate of metals and metal compounds is...
Embodiment 2
[0086] An organic electroluminescent device, including a substrate, an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer and a cathode stacked in sequence, the specific structure is expressed as: glass / IZO / V 2 o 5 / TAPC / ADN / BphenI / MoO 3 : Al / C60: WO 3 / Ca / Pt. The preparation steps are:
[0087] Provide a commercially available common glass, rinse the glass with distilled water and ethanol in sequence, and soak it in isopropanol overnight.
[0088] The anode was prepared by magnetron sputtering on the surface-treated glass surface. The material of the anode is IZO with a thickness of 300nm. The acceleration voltage of magnetron sputtering is 300V, the magnetic field is 50G, and the power density is 40W / cm 2 .
[0089] The working pressure is 2×10 -3 Under the condition of Pa, according to the vapor deposition rate of the organic material is 1nm / s, and the vapor deposition rate of the m...
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