A tokamak plasma rupture energy processing device and processing method
A plasma and energy processing technology, applied in the direction of output power conversion devices, electrical components, single-wire parallel feeding arrangements, etc.
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Embodiment 1
[0052] The varistor of embodiment 1 adopts five KPP-30-300 high-energy zinc oxide varistors of the same model to be connected in parallel, and the rated energy of the zinc oxide varistor formed by parallel connection reaches 150 kilojoules; flow capacity to absorb large current pulses; during the plasma rupture stage, if an overvoltage occurs in the energy processing device, and the voltage amplitude is greater than the varistor voltage of the varistor, the zinc oxide varistor will be turned on and the zinc oxide varistor will start to work , play the role of limiting overvoltage and absorbing energy.
[0053] The pulse capacitor unit in Example 1 uses 70 MKMJ2-5000 pulse capacitors of the same type connected in parallel, with a capacitance value of 0.35 farads, which are used to bear the large current pulse at the moment of rupture and store energy.
[0054] The resistance of the resistance unit of embodiment 1 is used to absorb energy, and is formed by parallel connection of...
Embodiment 2
[0058] The application of the tokamak plasma rupture energy processing device provided by embodiment 2 is as follows: Figure 5 As shown, compared with embodiment 1, the difference is that the three-phase filter of the inverter unit in embodiment 2 uses a single inductor L filter, and other parts are the same; compared with embodiment 1, because embodiment 2 reduces the filter The feedback of the capacitor current reduces the difficulty of control, and the corresponding control unit can reduce a current acquisition module, which reduces the cost; but the filtering effect of the high-frequency harmonics by using a single-inductance L filter is not as good as that of using an LCL filter.
[0059] The flow process of the plasma rupture energy treatment method provided by the present invention is as follows: Image 6 As shown, the plasma rupture energy processing device provided in conjunction with embodiment 1 is specifically described as follows:
[0060] (1) When the plasma ru...
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