Hydrogen removal method and system for aluminum melt

A technology of aluminum melt and hydrogen system, which is applied in the field of hydrogen removal method and system of aluminum melt, can solve problems such as hindering hydrogen diffusion and environmental pollution, and achieve the effects of improving pumping efficiency, reducing pollution, and reducing loss

Active Publication Date: 2015-07-01
宁波创润新材料有限公司
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Problems solved by technology

[0006] However, in the vacuum removal of hydrogen, the impurities in the aluminum melt, and the oxide film formed on the surface of the aluminum melt due to the reaction of aluminum and air seriously hinder the diffusion of hydrogen in the aluminum melt
In the floating dehydrogenation method, the oxide film and impurities formed on the surface of the aluminum melt will be mixed into the aluminum melt with the tumbling of the aluminum melt, which will not affect the quality of the subsequent formed aluminum products, and will flow into the aluminum melt The added active substance discharge also directly leads to environmental pollution

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  • Hydrogen removal method and system for aluminum melt
  • Hydrogen removal method and system for aluminum melt
  • Hydrogen removal method and system for aluminum melt

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Embodiment Construction

[0041] As mentioned in the background art, aluminum alloy materials in the semiconductor industry have high requirements for purity and density. However, in the existing hydrogen removal schemes for aluminum melts, including vacuum hydrogen removal and floating hydrogen removal, the hydrogen removal effect is poor, so that more hydrogen remains in the obtained pure aluminum and alloys, which affects the obtained pure aluminum. and alloy quality.

[0042] In view of the above defects, the present invention provides a method for removing hydrogen from molten aluminum and a system for removing hydrogen from molten aluminum. In the method for removing hydrogen from the aluminum melt, in the vacuum smelting furnace, after the aluminum ingot is heated into molten aluminum, the inert gas is continuously introduced into the molten aluminum, so that the hydrogen gas in the molten aluminum is separated out, and at the same time, the hydrogen gas in the molten aluminum is continuously pu...

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Abstract

The invention relates to a hydrogen removal method and system for aluminum melt. The hydrogen removal method for aluminum melt includes: melting an aluminum ingot into molten state aluminum, maintaining the inside of a vacuum melting furnace not lower than a second vacuum degree, simultaneously introducing inert gas into the molten state aluminum, and also pumping out the gas in the vacuum melting furnace; and after stopping introducing the gas, standing the molten state aluminum. According to the technical scheme, by introducing the inert gas into the molten state aluminum, the hydrogen dissolved in the molten state aluminum can be precipitated efficiently, at the same time the gas in the vacuum melting furnace is pumped out and can be discharged out of the vacuum melting furnace timely to prevent hydrogen from re-entering the molten state aluminum. The blowing hydrogen discharge process is carried out in a vacuum environment, uniform and fine bubbles can be formed to enhance the hydrogen precipitation effect. In the standing process, the hydrogen remaining in the molten state aluminum can diffuse to vacuum so as to further precipitate the hydrogen dissolved in the molten state aluminum, thus enhancing the hydrogen removal effect.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a method and system for removing hydrogen from aluminum melts. Background technique [0002] High-purity aluminum is widely used in the electronics industry, such as aluminum-chromium and aluminum-titanium alloys, which are used as reflective layers in magneto-optical media; aluminum-copper alloys are used as wire materials in circuits, and aluminum-copper alloys are used as wire materials in circuits. Silicon, aluminum-silicon-copper alloys can also be used as sputtering target materials, while aluminum-rubidium alloys and aluminum-tantalum alloys are used as metal reflective layers in flat-panel displays. The above-mentioned aluminum alloys have high requirements on purity and density. [0003] For high-purity aluminum materials, pinholes and pores are often fatal defects that destroy the quality of aluminum materials. They not only destroy the internal continuity of al...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22B21/06C22B9/04C22B9/05
Inventor 吴景晖姚力军张卫嘉
Owner 宁波创润新材料有限公司
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