Method for preparing high depth-width ratio polymer nanorod array by sacrificing template

A nano-pillar array and high aspect ratio technology, which is applied in the field of sacrificing templates to prepare high aspect ratio polymer nano-pillar arrays, can solve the problems of increased cost and difficulty in the manufacturing process, and achieves high manufacturing efficiency, good biocompatibility, high-resolution effects

Inactive Publication Date: 2015-07-29
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

However, the difficulty of the production process increases and the cost increases

Method used

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  • Method for preparing high depth-width ratio polymer nanorod array by sacrificing template
  • Method for preparing high depth-width ratio polymer nanorod array by sacrificing template
  • Method for preparing high depth-width ratio polymer nanorod array by sacrificing template

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Embodiment Construction

[0029] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments. The protection scope of the present invention should include all content of the claims. Through the following examples, those skilled in the art can realize all the contents of the claims of the present invention.

[0030] Such as figure 1 As shown in 1-1, a porous anodized aluminum template 1 with a pore diameter of 300 nanometers and a depth of 30 microns is used. The template area is 3 cm × 3 cm and the mass is 2 grams. The surface is cleaned with an alcohol solution.

[0031] Such as figure 1 As shown in 1-2, prepare a liquid mercapto-ene material with a viscosity of 3.5 centipoise and a Young’s modulus of 5 GPa. Use a dropper to drop a drop of liquid mercapto-ene material on template 1, and gently tilt and shake template 1 to form A uniform layer of mercapto-ene material layer 2 with a thickness of 1 mm, and at the same time, the mercap...

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Abstract

The invention relates to a method for preparing a high depth-width ratio polymer nanorod array by sacrificing a template, and belongs to the field of micro-nano structure processing. The preparation method comprises the following steps: taking a corrodible nanopore array structure as the template; coating a polymer material on the surface of the template by utilizing a coating process, and adjusting the viscosity and Young modulus of the polymer material, wherein not only is the defect that surface tension of nanopores flows into the holes overcome, but also the resolution and the depth-width ratio of nanorods can be effectively improved; placing the template coated with the polymer material under proper environment to be cured and formed; corroding the template by utilizing a corrosive solution so as to leave over the cured polymer material nanorod structure. The size and the depth-width ratio of the nanorods are controlled by the template and the polymer, the nanorods with small size and high depth-width ratio can be prepared, and meanwhile the same template can be prepared into the nanorods with different depths. The operation in the preparation process is simple, the cost is low, the depth-width ratio is controllable, and wide application prospects are realized in the field of biochemical sensing, biochemical analysis and the like.

Description

technical field [0001] The invention belongs to micro-nano structure processing, and in particular relates to a method for preparing a polymer nano-column array with a high aspect ratio by sacrificing a template. Background technique [0002] At present, nanopillar arrays are widely used in many fields such as magnetic recording, optoelectronic components, sensors, and heterogeneous catalysis. Among them, nanopillar arrays with small size and high aspect ratio have great potential in constructing nanoelectronic and optical devices due to their specific physical and chemical properties, which has aroused great interest of material scientists. [0003] There are two main ways to prepare traditional nanostructures. One is the traditional lithography technology represented by "ultraviolet, deep ultraviolet, extreme ultraviolet, and X-ray". These lithography techniques mainly achieve high resolution by continuously shortening the exposure wavelength. High-efficiency nanolithogra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C99/00
Inventor 邓启凌张满史立芳秦燕云曹阿秀庞辉
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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