Method for preparing nano platinum-coated gold particles film composite material

A composite material, gold particle technology, applied in metal material coating process, sputtering plating, ion implantation plating and other directions, can solve the problems of Au particle pollution, difficult particle fixation, complex technology, etc., to achieve low cost, Easy to operate, simple effect

Active Publication Date: 2015-08-05
HENAN UNIV OF SCI & TECH
7 Cites 8 Cited by

AI-Extracted Technical Summary

Problems solved by technology

Although people can prepare submicron and nanoscale gold films and gold particles by various methods in the laboratory, the prepared gold particles are basically free-state monodisperse particles or many particles are aggregated together, so it is difficult to These particles are fixed on the substrate or film surface
Although pure gold particles can be grown on the surface of the substrate or thin film by the template method, this method is technically complex, and it is easy to pollute th...
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Method used

Place respectively the Au target of purity 99.99at% and the Mo target of purity 99.99at% on the target position of coating machine, after target material and polyimide substrate are placed, the vacuum chamber of coating machine is closed, and Turn on the mechanical pump and molecular pump to evacuate the vacuum chamber to make the vacuum degree reach 0.0005Pa, and then heat the substrate stage at 200°C to keep the temperature stable;
[0045] The Au target with a purity of 99.99 at% and the Mo target with a purity of 99.99 at% are respectively placed on the target position of the coating machine. After placing the target material and the polyimide substrate, close the vacuum chamber of the coating machine, ...
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Abstract

The invention relates to a method for preparing a nano platinum-coated gold particles film composite material, which comprises the following steps: preparing a gold-molybdenum alloy film on surface of a polyimide matrix, keeping a certain temperature for the matrix so that gold atoms can be promoted to grow for obtaining the gold particles on the surface of the alloy film, and then depositing the platinum film on the surface of the prepared gold particles film to obtain the product. The method employs a magnetron sputtering double target co-deposition technique to prepare the gold-molybdenum alloy film and a matrix in-situ heating technology , the nanogold film/gold particles composite material can be prepared without a template, the nano platinum-coated gold particles film composite material with large comparison area and high performance is sputtered and deposited on the surface of the nanogold film/gold particles composite material, compared with a pure platinum film, the specific surface area of the nano platinum-coated gold particles film is increased by more than 20%.

Application Domain

Vacuum evaporation coatingSputtering coating +1

Technology Topic

Comparison areaSputter deposition +6

Examples

  • Experimental program(3)

Example Embodiment

[0030] Example 1
[0031] A preparation method of nano-platinum-coated gold particle film composite material includes the following steps:
[0032] (1) Cleaning of polyimide substrate
[0033] Put the flexible polyimide substrate into a beaker containing absolute ethanol, put the beaker in an ultrasonic cleaner for ultrasonic cleaning for 10 minutes, and then put the cleaned polyimide into a beaker containing deionized water Ultrasonic cleaning in the beaker for 5 minutes, dry the cleaned polyimide substrate with nitrogen, and then fix the polyimide substrate on the substrate table of the magnetron sputtering coater;
[0034] (2) Target preparation and heating of the coating machine substrate table
[0035] Place an Au target with a purity of 99.99at% and a Mo target with a purity of 99.99at% on the target position of the coating machine. After placing the target and the polyimide substrate, close the vacuum chamber of the coating machine and turn on the mechanical pump. 、The molecular pump evacuates the vacuum chamber to make the vacuum degree reach 0.0005Pa, and then heats the substrate stage to 200℃ to keep the temperature stable;
[0036] (3) Preparation of gold film/gold particle composite structure
[0037] The coating adopts the three-target position JCP-350 magnetron sputtering coating machine. When the temperature of the substrate table stabilizes to 200°C and the vacuum degree of the vacuum chamber reaches 0.0005Pa, high-purity argon gas is introduced into the vacuum chamber to make the vacuum chamber pressure. It reaches 0.2Pa. Then turn on the power of Au target and Mo target at the same time to start co-sputtering deposition of Au-Mo alloy film on the polyimide substrate. The sputtering power of Au target and Mo are 100W and 30W respectively, and both targets are sputtered 3 minute. The Au-9.1at.% Mo alloy film is prepared, and the film thickness is 40nm. After the film is deposited, the substrate stage continues to be kept warm for 30 minutes to promote the precipitation, nucleation, and growth of Au atoms in the alloy film on the surface to become Au particles with an average size of 55 nm. Thus, a nano-scale gold alloy film/nano-gold particle composite structure material is prepared in one step without using a template;
[0038] (4) Nano platinum film coated gold particle film composite material
[0039] In step (3), a platinum film is further deposited on the surface of the gold film/gold particle composite structure. The target material used for sputtering the platinum film is Pt with a purity of 99.99at%. When the vacuum degree of the vacuum chamber reaches 0.0001Pa, high-purity argon is passed into the vacuum chamber to make the pressure in the vacuum chamber reach 0.2Pa. Then turn on the Pt target power supply and start to deposit platinum film on the polyimide substrate. The film thickness is 5nm, and the high-performance nano-platinum film coated gold particle film composite material is obtained, which has a 23% increase in specific surface area compared with pure Pt film. .

Example Embodiment

[0040] Example 2
[0041] A preparation method of nano-platinum-coated gold particle film composite material includes the following steps:
[0042] (1) Cleaning of polyimide substrate
[0043] Put the flexible polyimide substrate into a beaker containing absolute ethanol, put the beaker in an ultrasonic cleaner for ultrasonic cleaning for 10 minutes, and then put the cleaned polyimide into a beaker containing deionized water Ultrasonic cleaning in the beaker for 10 minutes, dry the cleaned polyimide substrate with nitrogen, and then fix the polyimide substrate on the substrate table of the magnetron sputtering coating machine;
[0044] (2) Target preparation and heating of the coating machine substrate table
[0045] Place the Au target with a purity of 99.99at% and the Mo target with a purity of 99.99at% on the target position of the coating machine. After placing the target and polyimide substrate, close the vacuum chamber of the coater, and turn on the mechanical pump and molecular pump to vacuum the vacuum chamber to make the vacuum reach 0.0003Pa, and then heat the substrate table to the heating temperature 280℃, keep the temperature stable;
[0046] (3) Preparation of gold film/gold particle composite structure
[0047] The coating adopts a three-target JCP-350 magnetron sputtering coating machine. When the temperature of the substrate stage stabilizes to 280°C and the vacuum degree of the vacuum chamber reaches 0.0003Pa, high-purity argon is introduced into the vacuum chamber to make the pressure in the vacuum chamber reach 0.35Pa. Then turn on the power of Au target and Mo target at the same time to start co-sputtering deposition of Au-Mo alloy film on the polyimide substrate. The sputtering power of Au target and Mo are 120W and 50W respectively, and both targets are sputtered5 minute. The Au-15.6at.% Mo alloy film is prepared, and the film thickness is 55nm. After the film is deposited, the substrate stage continues to be kept warm for 40 minutes to promote the precipitation, nucleation, and growth of Au atoms in the alloy film on the surface to become Au particles with an average size of 150 nm. Thus, without using a template, a nano-gold film/gold particle composite structure material is prepared in one step;
[0048] (4) Nano platinum film coated gold particle film composite material
[0049] In step (3), a platinum film is further deposited on the surface of the gold film/gold particle composite structure. The target material used for sputtering the platinum film is Pt with a purity of 99.99at%. When the vacuum degree of the vacuum chamber reaches 0.0003Pa, high-purity argon is passed into the vacuum chamber to make the pressure in the vacuum chamber reach 0.5Pa. Then turn on the Pt target power supply and start to deposit platinum film on the polyimide substrate. The film thickness is 10nm, and a high-performance nano-platinum film coated gold particle film composite material is obtained, which has a 32% increase in specific surface area compared with pure Pt film. .

Example Embodiment

[0050] Example 3
[0051] A preparation method of nano-platinum-coated gold particle film composite material includes the following steps:
[0052] (1) Cleaning of polyimide substrate
[0053] Put the flexible polyimide substrate into a beaker containing absolute ethanol, put the beaker in an ultrasonic cleaner for ultrasonic cleaning for 15 minutes, and then put the cleaned polyimide into a beaker containing deionized water Ultrasonic cleaning in the beaker for 15 minutes, dry the cleaned polyimide substrate with nitrogen, and then fix the polyimide substrate on the substrate table of the magnetron sputtering coater;
[0054] (2) Target preparation and heating of the coating machine substrate table
[0055] Place the Au target with a purity of 99.99at% and the Mo target with a purity of 99.99at% on the target position of the coating machine. After placing the target and polyimide substrate, close the vacuum chamber of the coating machine, and turn on the mechanical pump and molecular pump to vacuum the vacuum chamber to make the vacuum reach 0.0001Pa, and then heat the substrate table to the heating temperature 330℃, keep the temperature stable;
[0056] (3) Prepare a gold film/gold particle composite structure in one step
[0057] The coating adopts a three-target JCP-350 magnetron sputtering coating machine. When the temperature of the substrate stage stabilizes to 330°C and the vacuum degree of the vacuum chamber reaches 0.0001Pa, high-purity argon is introduced into the vacuum chamber to make the pressure in the vacuum chamber reach 0.8Pa. Then turn on the power of Au target and Mo target at the same time to start co-sputtering deposition of Au-Mo alloy film on the polyimide substrate. The sputtering power of Au target and Mo are 150W and 40W respectively, and both targets are sputtered 9 minute. The Au-7.9at.% Mo alloy film is prepared, and the film thickness is 92nm. After the film is deposited, the substrate stage continues to be kept warm for 60 minutes to promote the precipitation, nucleation, and growth of Au atoms in the alloy film on the surface into Au particles with an average size of 275 nm. Thus, without using the template, a gold alloy film/gold particle composite structure material is prepared in one step;
[0058] (4) Nano platinum film coated gold particle film composite material
[0059] In step (3), a platinum film is further deposited on the surface of the gold film/gold particle composite structure. The target material used for sputtering the platinum film is Pt with a purity of 99.99at%. When the vacuum degree of the vacuum chamber reaches 0.0005Pa, high-purity argon is passed into the vacuum chamber to make the pressure in the vacuum chamber reach 0.8Pa. Then turn on the Pt target power supply and start to deposit platinum film on the polyimide substrate. The film thickness is 50nm, and the high-performance nano-platinum film coated gold particle film composite material is obtained. Compared with the pure Pt film, the specific surface area is increased by 45% .

PUM

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