Preparation method for desilication modified-attapulgite adsorbent
A technology for modifying attapulgite and attapulgite, applied in the field of papermaking, can solve the problems of low grade of attapulgite, poor adsorption performance, and many impurities, and achieve the effects of reducing impurities, improving performance, and simple operation method
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Embodiment 1
[0021] Add attapulgite adsorbent that has been treated with hydrochloric acid with a solid-to-liquid ratio of 1:5 and a concentration of 12% to 100ml of the clarified green liquor, and calcined at a high temperature of 250°C, shake at 25°C for 2 hours at a speed of 150r / min , centrifuge to take 10ml of filtrate and add deionized water, 0.15mol / L H 2 SO 4 and 5ml of 75g / L ammonium molybdate, shake well, add 100g / L oxalic acid and 10g / L SnCl after 10min at room temperature 2 5ml each, and then 45°C constant temperature water bath for 15min, the silicon adsorption removal rate was measured to be 87%.
Embodiment 2
[0023] Add attapulgite adsorbent that has been treated with hydrochloric acid with a solid-to-liquid ratio of 1:5 and a concentration of 8% to 100ml of the clarified green liquor, and calcined at a high temperature of 250°C, shake at a speed of 150r / min at 25°C for 2h , centrifuge to take 10ml of filtrate and add deionized water, 0.15mol / L H 2 SO 4 and 5ml of 75g / L ammonium molybdate, shake well, add 100g / L oxalic acid and 10g / L SnCl after 10min at room temperature 2 5ml each, and then 45°C constant temperature water bath for 15min, the silicon adsorption removal rate was measured to be 94%.
Embodiment 3
[0025] Add attapulgite adsorbent that has been treated with hydrochloric acid with a solid-to-liquid ratio of 1:5 and a concentration of 8% to 100ml of the clarified green liquor, and calcined at a high temperature of 200°C, shake at 25°C for 2 hours at a speed of 150r / min , centrifuge to take 10ml of filtrate and add deionized water, 0.15mol / L H 2 SO 4 and 5ml of 75g / L ammonium molybdate, shake well, add 100g / L oxalic acid and 10g / L SnCl after 10min at room temperature 2 5ml each, and then 15min in a constant temperature water bath at 45°C, the silicon adsorption removal rate was measured to be 90%.
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