High-temperature ceramic/metal riveting-glass sealing combination connection method
A technology of glass sealing and high-temperature ceramics, which is applied in the field of high-temperature ceramic/metal riveting-glass sealing composite connection, which can solve the problems of low operating temperature and poor joint strength, and achieve increased reliability, high-reliability sealed connection, and no stimulation The effect of sexual odor
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specific Embodiment approach 1
[0016] Specific implementation mode 1: In this implementation mode, a high-temperature ceramic / metal riveting-glass sealing compound connection method is specifically carried out according to the following steps:
[0017] 1. The ceramics and metals are pre-assembled, drilled and spot-faced, disassembled and deburred, cleaned in sequence, and then anodic oxidation is used to prepare a dense and uniform oxide film on the surface of the metal;
[0018] 2. Make the glass sealant and adhesive into a paste, then magnetically stir for 5-10 minutes, and then use the brushing method to evenly coat the metal and ceramic surfaces after step 1, and coat 1-5 layers to control the coating. Layer thickness is 100-500μm;
[0019] 3. Assemble, nail and rivet the ceramics and metals processed in step 3, and then perform riveting troubleshooting to obtain assembled test pieces;
[0020] 4. Put the assembled test piece into the resistance furnace, connect in the air atmosphere, control the tempe...
specific Embodiment approach 2
[0021] Specific embodiment two: the difference between this embodiment and specific embodiment one is that the ceramics described in step one are Al 2 o 3 Ceramic, Si 3 N 4 Ceramic or SiC, the metal is Ti alloy. Others are the same as in the first embodiment.
specific Embodiment approach 3
[0022] Embodiment 3: The difference between this embodiment and Embodiment 1 or 2 is that the anodic oxidation process parameters in step 1 are: control temperature 10-30°C, current density 5-15A / dm 2 , voltage 90-200V, time 10-40min, wherein the composition of the electrolyte is potassium dichromate 15-35g / L, manganese sulfate 15-25g / L, ammonium sulfate 15-25g / L, and the thickness of the oxide film is controlled to be 5 ~20μm. Others are the same as in the first or second embodiment.
[0023] The specific operation process of the anodic oxidation process is as follows: put the metal into the electrolyte, turn on the electricity, keep it for 10-40 minutes, and complete.
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