Susceptor with radiation source compensation

Abstract

Embodiments described herein relate to an apparatus and methods for temperature measurement. A susceptor may be configured to support a substrate on a first surface and second surface of the substrate may be oriented opposite the first surface. One or more reflective features may be formed on the second surface. The one or more reflective features may be disposed in various patterns at a radius viewed by a temperature sensor. The one or more reflective features may provide for increased reflection of radiation from the second surface of the susceptor and provide more accurate temperature calculations from a thermal signal detected by the temperature sensor.

Description

technical field [0001] Embodiments described herein generally relate to devices and methods of temperature measurement. More specifically, embodiments described herein relate to measuring the temperature of a susceptor exposed to a radiation source. Background technique [0002] Accurate temperature measurement in certain semiconductor processing chambers is important for substrate processing. For example, in an epitaxial deposition chamber, a heat source providing radiant energy may be used to heat a substrate disposed on a susceptor. Radiation pyrometry can be used to measure the thermal signature of the bottom surface of the susceptor, since the bottom surface generally exhibits a generally constant emissivity. The thermal signature can be detected by a pyrometer and the susceptor temperature can be calculated from the thermal signature. [0003] However, radiation can reflect from the base to the pyrometer and artificially increase the thermal signature detected by th...

AI Technical Summary

Problems solved by technology

More generally, however, inaccuracies arise from the effects of radiation source aging, radiation source replacement, susceptor replacement, and process parameter drift

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