Light-emitting diode epitaxial structure containing AlGaN conducting layer, and manufacturing method thereof
A technology of light-emitting diodes and epitaxial structures, applied in circuits, electrical components, semiconductor devices, etc., can solve problems such as low efficiency and low internal quantum efficiency, and achieve the effects of improving efficiency, improving internal quantum efficiency, and suppressing electron leakage
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[0031] The present invention will be further described below in conjunction with the accompanying drawings and examples, but not limited thereto.
[0032] Such as figure 1 As shown, the light emitting diode epitaxy includes sapphire substrate 1 , GaN buffer layer 2 , N-type GaN conductive layer 3 , multi-quantum well active region 6 and P-type AlnGaN conductive layer 7 from bottom to top.
[0033] The steps of the method for preparing a light emitting diode epitaxial structure with an AlGaN conductive layer are as follows:
[0034] (1). Put the sapphire substrate into the metal-organic chemical vapor phase chemical deposition equipment, pass in hydrogen, raise the temperature of the reaction chamber to 1300 degrees Celsius, and perform high-temperature cleaning on the substrate.
[0035] (2). Reduce the temperature of the reaction chamber to 1100 degrees, feed ammonia, hydrogen and trimethylgallium, and grow a 3um unintentionally doped GaN buffer layer on the substrate descri...
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