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Manufacturing method for nuclear track etching film

A technology of nuclear track etching and manufacturing method, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve the problems of difficult single-conical micropore diameter D1, unsuitable for mass production, difficult to operate, etc. , to achieve the effect of easy implementation, low cost and simple process

Inactive Publication Date: 2015-12-16
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has the following disadvantages: 1. It is not easy to implement the diameters D1 and D2 of the single tapered microhole; 2. Due to the need to isolate the two etching solutions, it is difficult to operate and can only be produced in a small amount in the laboratory, which is not suitable for mass production.

Method used

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  • Manufacturing method for nuclear track etching film
  • Manufacturing method for nuclear track etching film
  • Manufacturing method for nuclear track etching film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] This embodiment is used to illustrate a method for fabricating a nuclear track etching film provided by the present invention. Specific steps are as follows:

[0022] Irradiation: 30μm polyester film is used as the base film; on the tandem accelerator of the China Institute of Atomic Energy, a sulfur ion beam with an energy of 120-500MeV is generated, and the beam intensity is 0.1nA-1mA, which is radiated on the base film , use the energy-reducing sheet in front of the basement film to reduce the energy of the particles, so that the range of ions in the film is 25-28 μm, the irradiation time is 0.1-0.8 seconds, and the latent track density formed on the basement film after irradiation is 1 ×10 5 / cm 2 ;

[0023] Etching: put the irradiated base film into NaOH aqueous solution with a concentration of 8mol / L for etching, the etching time is 20min, and the etching temperature is 70°C;

[0024] Cleaning: use a weak acid solution (pH 2, the same below) and pure water to ...

Embodiment 2

[0028] This embodiment is used to illustrate a method for fabricating a nuclear track etching film provided by the present invention. Specific steps are as follows:

[0029] Irradiation: select the polypropylene film of 50 μm as the base film; irradiate as in the method of embodiment 1, the irradiation depth (the range of the ion in the film) is 45 μm, and the latent track density formed on the base film after irradiation is 1×10 5 / cm 2 ;

[0030] Etching: put the irradiated base film into H2 with a concentration of 6mol / L 2 SO 4 and 0.8mol / L potassium dichromate aqueous solution for etching, the etching time is 50min, and the etching temperature is 75°C;

[0031] Cleaning: Clean the etched base film with weak acid solution and pure water;

[0032] Drying: Dry the cleaned base film in an oven at a temperature of 70°C.

[0033] After testing, the density of the single tapered micropores formed on the microporous membrane made in Example 2 is 1 × 10 4 ~1×10 7 / cm 2 , ...

Embodiment 3

[0035] This embodiment is used to illustrate a method for fabricating a nuclear track etching film provided by the present invention. Specific steps are as follows:

[0036] Irradiation: Select 15 μm polyimide film as the base film; irradiate as in the method of Example 1, the irradiation depth (the range of the ion in the film) is 13 μm, and the latent track formed on the base film after irradiation Density is 6×10 5 / cm 2 ;

[0037] Etching: put the irradiated base film into KMnO with a concentration of 0.5mol / L 4 Soak in the aqueous solution for 20min, then etch with 1mol / L sodium hypochlorite aqueous solution, the etching time is 20min, and the etching temperature is 65°C;

[0038] Cleaning: use weak acid solution and pure water to clean the etched base film;

[0039] Drying: Dry the cleaned base film at a temperature of 70°C.

[0040] After testing, the density of the single tapered micropores formed on the microporous membrane made in Example 3 is 6 × 10 5 / cm 2 ...

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Abstract

The invention relates to a manufacturing method for a nuclear track etching film. The manufacturing method comprises the following steps: irradiation: irradiating a polymer thin film by energetic ions which are generated by an accelerator and have proper energy, so that the range of the ions in the thin film is larger than 2 / 3 of the thickness of the thin film and smaller than the thickness of the thin film; etching: soaking the polymer thin film subjected to irradiation for etching; cleaning: cleaning the etched polymer thin film by clean water; drying: drying the cleaned thin film polymer. The manufacturing method provided by the invention is simple in technology, easy to implement and low in cost; by adoption of the method, a heavy ion microhole film with single conical microholes of which the diameter (D1) of the sectional circle at the small-aperture end is 0.1-15 microns and the diameter (D2) of the sectional circle at the large-aperture end is 0.2-20 microns can be manufactured.

Description

technical field [0001] The invention belongs to the technical field of nuclear track etching films, and in particular relates to a manufacturing method of nuclear track etching films. Background technique [0002] Nuclear track etching membrane is a high-quality microporous membrane produced by nuclear technology. Its micropores are approximately cylindrical straight through holes with uniform pore size. It is an ideal filter membrane for precision filtration and sieving of particles. The filtration mechanism is sieving filtration. It is reusable, has strong pressure bearing capacity, high temperature resistance, good chemical and biological stability, and is currently the best precision filter material. . At present, it has been widely used in electronics, food, chemical, pharmaceutical and other industries and fields such as biology, medicine, environment, analysis and detection, and has a very broad application prospect. [0003] Generally, nuclear track-etched membrane...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D67/00B01D71/06B01D69/02
Inventor 吴振东梁海英焦学胜陈东风鞠薇傅元勇王雪杰
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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