Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Meter-level large diameter polarizer full-band surface shape processing method

A large-aperture, polarizer technology, applied in polarizing elements and other directions, can solve problems such as the inability to meet the full-band index requirements of meter-scale large-diameter polarizers, the negative impact of surface shape control, and the small-scale intermediate frequency waviness.

Active Publication Date: 2015-12-23
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF5 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the other hand, for the annular polishing process of large-diameter optical components, even if the rotational speed of the polishing disc is small, due to the large size of the workpiece itself and the weight of the correction disc, the heat generated by friction is easy to accumulate, and the control of the surface shape brings very serious negative impact
In addition, the more important thing is that the uniformity of the UBK7 material used in the polarizer element that can be obtained in China is the best to reach 3ppm, and the thickness of the polarizer element is greater than 90mm, and the transmission wavefront error caused by the uniformity is greater than λ / 3 (λ=632.8nm) requirements, it is theoretically impossible to achieve the processing requirements of the transmitted wavefront by using the annular polishing technology
[0009] The small tool polishing technology with computer control as the core, such as small grinding head polishing technology, magnetorheological polishing technology and ion beam polishing technology, etc., can well overcome the problem of material refractive index non-uniformity due to the ability of local surface shape correction , to achieve high-precision low-frequency reflection and transmission surface processing, but because the CNC small tool polishing technology uses a grinding head that is much smaller than the workpiece size, small-scale intermediate frequency waviness problems will occur on the surface of the workpiece, resulting in the It is difficult to meet the requirements of the frequency band error of the processed surface
Therefore, it is impossible to meet the full-band index of meter-scale large-diameter polarizers by using ring polishing or CNC small tools alone.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] A method for processing the full-band surface shape of a meter-scale large-diameter polarizer. The processing object is a polarizer substrate of 810mm×430mm×107mm. The initial reflection surface shape accuracy is 0.6λ (λ=632.8nm), and the initial transmission surface shape accuracy is 1.3λ (λ=632.8nm), the method comprises the following steps:

[0022] 1) Magneto-rheological polishing of reflective surface: use NUBULA-UPF-60 magnetorheological polishing machine to polish the reflective surface of large-diameter polarizer, and use a 300mm caliber interferometer to detect the polished reflective surface. When the surface shape accuracy of the reflective surface reaches 0.2λ , when the GRMS is λ / 120 / cm, enter the next step of reflective surface processing;

[0023] 2), the shape of the reflective surface is smooth and smooth: use the accompanying throwing plate (polarizer of the same size) to calibrate the 2.4m ring polishing machine, use a thermometer to control the ambie...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a meter-level large diameter polarizer full-band surface shape processing method. According to the method, through combining magnetorheological finishing and conformal fairing finishing, the processing precision of a meter-level large diameter polarizer can be effectively controlled, the meter-level large diameter polarizer with a full-band index which reaches a standard in a high power laser system is manufactured, the concrete indexes of transparent and reflective surfaces are as follows: PV is smaller than or equal to lambda / 3, GRMS is smaller than or equal to 7nm / cm, PSD1RMS is smaller than or equal to 1.8nm, PSD2RMS is smaller than or equal to 1.1nm, and surface roughness is smaller than or equal to 1nm.

Description

technical field [0001] The invention belongs to the processing of optical elements, in particular to a method for processing the surface shape of a meter-level large-diameter polarizer in full frequency range. technical background [0002] In a high-power laser system, in order to obtain the ideal beam focusing quality, the surface error of precision optical components must not only achieve good low-frequency surface accuracy, surface quality and ultra-smooth surface roughness indicators, but also meet extremely strict intermediate frequency requirements. The wavefront error requirement, that is, the wavefront error requirement is for the entire frequency band. According to the influence of different frequency band errors on optical performance, the surface error of optical components in NIF is divided into three spatial frequency bands: [0003] Low frequency band (error space period length L>33mm), [0004] Middle frequency band (33mm≥L≥0.12mm), [0005] High-frequen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/30B24B1/00
Inventor 魏朝阳邵建达徐学科易葵顾昊金程鑫
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products